Specific Process Knowledge/Thin film deposition/Furnace LPCVD TEOS: Difference between revisions
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==Overview of the performance of the LPCVD TEOS furnace and some process related parameters== | ==Overview of the performance of the LPCVD TEOS furnace and some process related parameters== | ||
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!style="background:silver; color:black | !colspan="2" border="none" style="background:silver; color:black" align="center"|Purpose | ||
|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"|'''Deposition of TEOS oxide''' | ||
Deposition of TEOS oxide | |||
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!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Performance | !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Performance | ||