Specific Process Knowledge/Etch/ASE (Advanced Silicon Etch): Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@Nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.Nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/ASE_(Advanced_Silicon_Etch) click here]''' | '''Feedback to this page''': '''[mailto:labadviser@Nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.Nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/ASE_(Advanced_Silicon_Etch) click here]''' | ||
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= The ASE = | = The ASE = | ||
[[image:ASE.jpg|300x300px|right|thumb|STS ASE - positioned in cleanroom B-1]] | [[image:ASE.jpg|300x300px|right|thumb|STS ASE - positioned in cleanroom B-1. {{photo1}} ]] | ||
Name: M/PLEX ICP - ASE (Advanced Silicon Etcher) <br> | Name: M/PLEX ICP - ASE (Advanced Silicon Etcher) <br> | ||
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*[[Specific Process Knowledge/Etch/Etching of Silicon/Si etch using ASE|Etch of Silicon using ASE]] | *[[Specific Process Knowledge/Etch/Etching of Silicon/Si etch using ASE|Etch of Silicon using ASE]] | ||
*[[Specific Process Knowledge/Etch/Etching of Polymer/Polymer Etch by ASE|Etch of polymers using ASE]] | *[[Specific Process Knowledge/Etch/Etching of Polymer/Polymer Etch by ASE|Etch of polymers using ASE]] | ||
*[[Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using ASE|Etch of SiO2 using ASE]] | *[[Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using ASE|Etch of SiO2/SiN using ASE]] | ||
==An overview of the performance of the ASE and some process related parameters== | ==An overview of the performance of the ASE and some process related parameters== | ||