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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/AOE_(Advanced_Oxide_Etch) click here]'''  
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/AOE_(Advanced_Oxide_Etch) click here]'''  
[[Category: Equipment|Etch AOE]]
[[Category: Equipment|Etch AOE]]
[[Category: Etch (Dry) Equipment|AOE]]
[[Category: Etch (Dry) Equipment|AOE]]


''This page is written by DTU Nanolab internals if nothing else is stated'' <br>


== Etching using the dry etch technique AOE (Advanced oxide etch) ==
== Etching using the dry etch technique AOE (Advanced oxide etch) ==
[[Image:AOE.jpg|300x300px|thumb|AOE: positioned in cleanroom B-1, photo: DTU Nanolab internal]]
[[Image:AOE.jpg|300x300px|thumb|AOE: positioned in cleanroom B-1, {{photo1}}]]


Name: M/PLEX ICP - AOE (Advanced Oxide Etcher) <br>
Name: M/PLEX ICP - AOE (Advanced Oxide Etcher) <br>
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