Specific Process Knowledge/Thin film deposition/Deposition of Scandium: Difference between revisions
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== Deposition of Scandium == | == Deposition of Scandium == | ||
Latest revision as of 19:23, 10 June 2025
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Deposition of Scandium
Deposition of Sc can only be done by sputtering using 4-inch Sc target.
The only tool for this application is the Cluster-based multi-chamber high vacuum sputtering deposition system, commonly referred to as the 'Cluster Lesker.' The operating process is thoroughly documented and described in detail.:
- Deposition of Scandium (Sc) using sputtering in Sputter-System Metal-Nitride(PC3) Source 1 (4-inch target)
At the moment (October 2023) we have a 4-inch Sc target (0.250" thick bonded to Cu) for PC3 Src1.