Specific Process Knowledge/Thermal Process/Furnace APOX: Difference between revisions
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'''Feedback to this page''': '''[mailto:thinfilm@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Furnace_APOX click here]''' | '''Feedback to this page''': '''[mailto:thinfilm@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Furnace_APOX click here]''' | ||
'''<p style="color:red;">The APOX furnace has been decomissioned in August 2019.</span>''' | |||
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[[Category: Thermal process|APOX]] | [[Category: Thermal process|APOX]] | ||
[[Category: Furnaces|APOX]] | [[Category: Furnaces|APOX]] | ||
==Apox furnace (D1)== | ==Apox furnace (D1)== | ||
[[Image:APOX.JPG|thumb|300x300px|Apox furnace (D1): positioned in the A-5 room]] | [[Image:APOX.JPG|thumb|300x300px|Apox furnace (D1): positioned in the A-5 room/ Photo: DTU Nanolab internal]] | ||
The APOX furnace (D1) is a Tempress horizontal furnace for oxidation silicon wafers. This furnace is dedicated for oxidation of new and clean Si wafers to form apox layers which is a very thick wet thermal oxide grown at 1075<sup>o</sup>C. Running a batch of apox wafers (oxide thickness > 5µm) can take several weeks, depending on how thick an apox layer that is required. | The APOX furnace (D1) is a Tempress horizontal furnace for oxidation silicon wafers. This furnace is dedicated for oxidation of new and clean Si wafers to form apox layers which is a very thick wet thermal oxide grown at 1075<sup>o</sup>C. Running a batch of apox wafers (oxide thickness > 5µm) can take several weeks, depending on how thick an apox layer that is required. | ||