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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Characterization/XPS click here]'''
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Characterization/XPS click here]'''
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==The XPS tools at DTU Nanolab==
==The XPS tools at DTU Nanolab==


[[image:XPS K-Alpha.jpg |300px|left| The XPS K-Alpha ]]
[[Image:XPS K-Alpha.jpg |thumb|x300px|The K-Alpha from 2007 is one of the first instruments of this type that was produced.{{photo1}} ]]
[[image:XPS Nexsa.png |300px|right| The XPS Nexsa ]]
[[Image:XPS Nexsa.png |thumb|x300px|The Nexsa from 2019 is on the surface very similar to the K-Alpha. Its panels, however, hide a whole range of supplementary techniques.{{photo1}} ]]
 
[[Image:XPS K-Alpha.jpg |frame|left|x300px|The K-Alpha from 2007 is one of the first instruments of this type that was produced.]]
[[Image:XPS Nexsa.png |frame|left|x300px|The Nexsa from 2019 is on the surface very similar to the K-Alpha. It's panels, however, hide a whole range of supplementary techniques.]]




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*[[Specific Process Knowledge/Characterization/XPS/XPS elemental composition|Elemental analysis]]
*[[Specific Process Knowledge/Characterization/XPS/XPS elemental composition|Elemental analysis]]
*[[Specific Process Knowledge/Characterization/XPS/XPS Depth profiling|Depth profiling]]
*[[Specific Process Knowledge/Characterization/XPS/XPS Depth profiling|Depth profiling]]
*[[/Carbon contamination|Carbon contamination]]
*[[Specific Process Knowledge/Characterization/XPS/Carbon contamination|Carbon contamination]]


*[[Specific Process Knowledge/Characterization/XPS/ExtDocs | Links to external material ]]
*[[Specific Process Knowledge/Characterization/XPS/ExtDocs | Links to external material ]]
*[[Specific Process Knowledge/Characterization/XPS/Training | Links to instruction videos ]]


== Getting access to the XPS tools==
== Getting access to the XPS tools==
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== Analyzing XPS spectra ==
== Analyzing XPS spectra ==


The analysis of XPS spectra is an art in itself. Click on the link below to find a some examples in which the Avantage software package has been used to extract information from experiments.
The analysis of XPS spectra is an art in itself. It can be done using various software packages available on the internet. In the links below we will focus on two such examples, Avantage and CasaXPS.


*[[Specific Process Knowledge/Characterization/XPS/Processing|Processing XPS data]]
*[[Specific Process Knowledge/Characterization/XPS/SoftwareInstall|How to access XPS software: Download/install or by access to server]]
*[[Specific Process Knowledge/Characterization/XPS/Processing|Processing XPS data with Avantage]]
*[[Specific Process Knowledge/Characterization/XPS/Export2CasaXPS | Export Avantage data to CasaXPS]]


==Techniques and option on the XPS tools==
==Techniques and option on the XPS tools==
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|-
|-
!style="background:silver; color:black;" align="left" colspan="2"|Equipment  
!style="background:silver; color:black;" align="left" colspan="2"|Equipment  
!style="background:silver; color:black;" align="left" |[[Specific Process Knowledge/Characterization/XPS/K-Alpha |K-Alpha]]
!style="background:silver; color:black;" align="left" |[[Specific Process Knowledge/Characterization/XPS/K-Alpha |XPS K-Alpha (Manufactured by Thermofisher)]]
!style="background:silver; color:black;" align="left" |[[Specific Process Knowledge/Characterization/XPS/Nexsa |Nexsa]]
!style="background:silver; color:black;" align="left" |[[Specific Process Knowledge/Characterization/XPS/Nexsa |XPS Nexsa (Manufactured by Thermofisher)]]
|-  
|-  
!style="background:silver; color:black;" align="left"|Purpose  
!style="background:silver; color:black;" align="left" rowspan="2"|Purpose  
|style="background:LightGrey; color:black"|Chemical analysis
|style="background:LightGrey; color:black"|Main
|style="background:WhiteSmoke; color:black"| XPS analysis using monochromated Al-Kα radiation at 1486.6 eV
|style="background:WhiteSmoke; color:black"| XPS analysis using monochromated Al-Kα radiation at 1486.6 eV
|-
 
|style="background:LightGrey; color:black"|Alternative/complementary
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
* [[Specific Process Knowledge/Characterization/XPS/XPS elemental composition|Probing elemental composition]]
* Work function measurements
* [[Specific Process Knowledge/Characterization/XPS/XPS Chemical states |Chemical state identification]]
|style="background:WhiteSmoke; color:black"|
* Non destructive technique
* Work function measurements
* Surface sensitive
* [[Specific Process Knowledge/Characterization/XPS/UPS technique| Ultraviolet Photoelectron Spectroscopy (UPS) with He I and He II UV source]]
* [[Specific Process Knowledge/Characterization/XPS/XPS Depth profiling|Depth profiling]] possible by ion beam etch of sample
* [[Specific Process Knowledge/Characterization/XPS/ISS|Ion Scattering Spectroscopy or ISS]]
* [[Specific Process Knowledge/Characterization/XPS/REELS|Reflected Electron Energy Loss Spectroscopy or REELS]]
* Angular Resolved Ultraviolet Photoelectron Spectroscopy (ARUPS)
* [[Specific Process Knowledge/Characterization/XPS/Raman|Raman spectroscopy]]
|-
|-
!rowspan="5" style="background:silver; color:black" align="left"| Performance
!rowspan="5" style="background:silver; color:black" align="left"| Performance
|style="background:LightGrey; color:black"|Spot size
|style="background:LightGrey; color:black"|Spot size
|style="background:WhiteSmoke; color:black"|Can be set between 30µm - 400µm
|style="background:WhiteSmoke; color:black"|XPS: 30µm - 400µm
|style="background:WhiteSmoke; color:black"|
* XPS: 10µm - 400µm
* Raman: > 15 µm
|-
|-
|style="background:LightGrey; color:black"|Probing depth
|style="background:LightGrey; color:black"|Pass energy
|style="background:WhiteSmoke; color:black"|Depending on probed element. Max probe depth lies within 10-200 Å.
|style="background:WhiteSmoke; color:black"|10-400 eV
|style="background:WhiteSmoke; color:black"|10-400 eV (XPS and ISS)
|-
|-
|style="background:LightGrey; color:black"|Resolution
|style="background:LightGrey; color:black"|Analysis modes
|style="background:WhiteSmoke; color:black"|Dependent on probed elements. Concentrations down to about 0,5 atomic % can in some cases be detected.
|style="background:WhiteSmoke; color:black"|Scanned and snapshot
|style="background:WhiteSmoke; color:black"|Scanned, snapshot and SnapMap
|-
|-
|style="background:LightGrey; color:black"|Charge compensation  
|style="background:LightGrey; color:black"|Charge compensation  
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"| Flood gun to be used for charge compensation of non conductive samples only
Flood gun can be used for charge compensation of non conductive samples
|style="background:WhiteSmoke; color:black"| Flood gun to be used for charge compensation of non conductive samples and for source of low energy electrons (REELS)
|-
|style="background:LightGrey; color:black"|Finding structures
|style="background:WhiteSmoke; color:black"|Choose measuring spot from camera image (magnified)
|-
|-
|-
!rowspan="2" style="background:silver; color:black" align="left"|Depth profiling
|style="background:LightGrey; color:black"|Purpose
|style="background:WhiteSmoke; color:black"|With ion beam etch the top layer of the material can be removed, to do a depth profiling
|-
|-
|style="background:LightGrey; color:black"|Ion beam size
|style="background:LightGrey; color:black"|Depth profiles
|style="background:WhiteSmoke; color:black"| About 3x1 mm
|style="background:WhiteSmoke; color:black"|Depth profiles with single Ar ion bombardment
 
* Monoatomic energy range 200-3000 eV
|style="background:WhiteSmoke; color:black"|Depth profiles with MonoAtomic and Gas Cluster Ion Source ([[Media:MAGCIS.pdf |MAGCIS]])
* Monoatomic energy range 200-4000 eV
* Cluster mode energy range: 2-8 keV
*Cluster size range: 75-2000 atoms
|-
|-
!rowspan="2" style="background:silver; color:black" align="left"|Substrates
!rowspan="2" style="background:silver; color:black" align="left"|Substrates / Samples
|style="background:LightGrey; color:black"|Substrate size
|style="background:LightGrey; color:black"|Sample holder size
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"| Maximum 60x60 mm
Maximum 60x60 mm
|style="background:WhiteSmoke; color:black"| Maximum 60x60 mm
|-
|-
| style="background:LightGrey; color:black"|Substrate thickness
| style="background:LightGrey; color:black"|Sample height
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"| Maximum 20 mm
Maximum height about 20 mm
|style="background:WhiteSmoke; color:black"| Maximum 20 mm
|-  
|-  
|}
|}
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