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Specific Process Knowledge/Etch/Wet Silicon Oxide Etch (BHF): Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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'''The user manual for various HF baths in RCA and Fume hoods, APV's and contact information can be found in LabManager''' [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=64 by clicking here]
'''The user manual for various HF baths in RCA and Fume hoods, APV's and contact information can be found in LabManager''' [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=64 by clicking here]


'''Working with HF above 13% is only allowed by Nanolab staff'''
'''<big>Working with HF above 13% is only allowed by Nanolab staff</big>'''


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*Mainly for removing native oxide
*Mainly for removing native oxide
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Mainly for etching deep into borofloat or quartz wafers
*Mainly for etching deep into borofloat or quartz wafers. '''Only Nanolab staff are allowed to work with this HF'''.
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Etching of silicon oxide - especially for etching small holes
*Etching of silicon oxide - especially for etching small holes
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!  
!  
! 1% HF in RCA Bench
! 1% HF in RCA Bench
! 1% HF PP-bath
! 10% HF in D3 wet bench 5 (Oxide etch 3)
! 1% HF Plastic beaker
! 1% HF Plastic beaker


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!Size of substrate
!Size of substrate
|2"-6" wafers
|2"-6" wafers
|2"- 4" wafers or any that fits in a dedicated holder
|2"- 6" wafers or any that fits in a dedicated holder
|2"- 4" wafers or any that fits in a dedicated holder
|2"- 4" wafers or any that fits in a dedicated holder
|-
|-
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<br clear="all" />
<br clear="all" />


==Comparing different 40% HF baths==
==40% HF==
{|border="1" cellspacing="1" cellpadding="3" style="text-align:left;"  
{|border="1" cellspacing="1" cellpadding="2" style="text-align:left;"  
|-
|-


|-style="background:silver; color:black"
|-style="background:silver; color:black"
!  
!  
! 40% HF PP-bath
! 40% HF in Plastic beaker, only done by Nanolab staff
! 40% HF Plastic beaker


|-  
|-  
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!Batch size!
!Batch size!
|1-25 wafers at a time
|1 wafer at a time
|1 wafer at a time
|-
|-
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|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
!Size of substrate
!Size of substrate
|Any that fits to a dedicated holder
|Any that fits to a dedicated holder
|Any that fits to a dedicated holder
|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!Allowed materials
!Allowed materials
|All materials
|All materials  
|All materials  
|-
|-
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