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Specific Process Knowledge/Etch/Wet Silicon Oxide Etch (BHF): Difference between revisions

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'''The user manual for Oxide etch 2: BHF (clean), APV's and contact information can be found in LabManager''' [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=378 by clicking here]
'''The user manual for Oxide etch 2: BHF (clean), APV's and contact information can be found in LabManager''' [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=378 by clicking here]
'''The user manual for Oxide etch 3: 10% HF, APV's and contact information can be found in LabManager''' [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=380 by clicking here]


'''The user manual for various HF baths in RCA and Fume hoods, APV's and contact information can be found in LabManager''' [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=64 by clicking here]
'''The user manual for various HF baths in RCA and Fume hoods, APV's and contact information can be found in LabManager''' [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=64 by clicking here]
'''<big>Working with HF above 13% is only allowed by Nanolab staff</big>'''


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*Mainly for removing native oxide
*Mainly for removing native oxide
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Mainly for etching deep into borofloat or quartz wafers
*Mainly for etching deep into borofloat or quartz wafers. '''Only Nanolab staff are allowed to work with this HF'''.
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Etching of silicon oxide - especially for etching small holes
*Etching of silicon oxide - especially for etching small holes
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<br clear="all" />
<br clear="all" />


<gallery caption="Different places to do wet silicon oxide etch" widths="220px" heights="225px" perrow="5"> image:BHF clean.JPG|BHF clean wetbench 04 in D-3. Wet silicon oxide etch bath positioned to the right in the wetbench. This bath can also be used for BHF with wetting agent.  
<gallery caption="Different places to do wet silicon oxide etch" widths="420px" heights="425px" perrow="5"> image:BHF clean.JPG|BHF in wetbench 04 in D-3 (Oxide etch 2: BHF (clean)). Wet silicon oxide etch bath positioned to the right in the wetbench. This bath can also be used for BHF with wetting agent.  
image:KOH_BHF.JPG|BHF in wetbench 01 Si etch in D-3 (Oxide etch 1: BHF.) The BHF bath is positioned in the middle of the bench. This is primarily used to remove oxide before and after a Si etch.
image:KOH_BHF.JPG|BHF in wetbench 01 Si etch in D-3 (Oxide etch 1: BHF). The BHF bath is positioned in the middle of the bench. This is primarily used to remove oxide before and after a Si etch.
image:RCA-HF.jpg|HF baths in RCA bench in B-1.  
image:BHF clean.JPG|BHF in wetbench 05 in D-3 (Oxide etch 3: 10% HF). Wet silicon oxide etch bath positioned to the right in the wetbench. This bath can also be used for BHF, BHF with wetting agent or 40% HF on request. This bath is also used for cleaning quarts carriers from the PECVD4 system.
image:Stinkskab RR2.jpg|The HF bath in 'Fume hood(RCA)' in cleanroom B-1 is only for use during special RCA cleaning processes inside the fume hood. </gallery>
image:RCA-HF.jpg|HF baths in RCA bench in B-1. These may only be used together with RCA cleaning and furnace processes.
</gallery>




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!  
!  
! 1% HF in RCA Bench
! 1% HF in RCA Bench
! 1% / 5% HF PP-bath
! 10% HF in D3 wet bench 5 (Oxide etch 3)
! 1% / 5% HF Plastic beaker
! 1% HF Plastic beaker


|-  
|-  
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!Size of substrate
!Size of substrate
|2"-6" wafers
|2"-6" wafers
|2"- 4" wafers or any that fits in a dedicated holder
|2"- 6" wafers or any that fits in a dedicated holder
|2"- 4" wafers or any that fits in a dedicated holder
|2"- 4" wafers or any that fits in a dedicated holder
|-
|-
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<br clear="all" />
<br clear="all" />


==Comparing different 40% HF baths==
==40% HF==
{|border="1" cellspacing="1" cellpadding="3" style="text-align:left;"  
{|border="1" cellspacing="1" cellpadding="2" style="text-align:left;"  
|-
|-


|-style="background:silver; color:black"
|-style="background:silver; color:black"
!  
!  
! 40% HF PP-bath
! 40% HF in Plastic beaker, only done by Nanolab staff
! 40% HF Plastic beaker


|-  
|-  
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!Batch size!
!Batch size!
|1-25 wafers at a time
|1 wafer at a time
|1 wafer at a time
|-
|-
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|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
!Size of substrate
!Size of substrate
|Any that fits to a dedicated holder
|Any that fits to a dedicated holder
|Any that fits to a dedicated holder
|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!Allowed materials
!Allowed materials
|All materials
|All materials  
|All materials  
|-
|-
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