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'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/Etching_of_Aluminium click here]'''
<!--Page reviewed by jmli 1/8-2016  -->
<!--Page reviewed by jmli 1/8-2016  -->
 
<!-- Ok, jmli 2020-0120 -->
==Etching of Aluminium==
==Etching of Aluminium==


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|-style="background:silver; color:black"
|-style="background:silver; color:black"
!
!
![[Specific Process Knowledge/Etch/Wet Aluminium Etch|Al wet etch 1]]
![[Specific Process Knowledge/Etch/Wet Aluminium Etch|Aluminium Etch]]
![[Specific Process Knowledge/Etch/Wet Aluminium Etch|Al wet etch 2]]
![[Specific_Process_Knowledge/Lithography/Development#Developer:_TMAH_Manual|Developer TMAH manual]]
![[Specific_Process_Knowledge/Etch/ICP_Metal_Etcher|ICP metal]]
![[Specific_Process_Knowledge/Etch/ICP_Metal_Etcher|ICP metal]]
![[Specific_Process_Knowledge/Etch/IBE&frasl;IBSD Ionfab 300|IBE (Ionfab300+)]]
![[Specific_Process_Knowledge/Etch/IBE&frasl;IBSD Ionfab 300|IBE (Ionfab300+)]]
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|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!Generel description
!Generel description
|Wet etch of pure Al
|Wet etch of Al
|Wet etch of Al + 1.5% Si
|Wet etch/removal: TMAH<br>
|Wet etch/removal: TMAH
Mainly used for removing Al on e-beam resist after e-beam exposure, see process flow [[Specific_Process_Knowledge/Lithography/EBeamLithography#Aluminum_coating| here]]
|Dry plasma etch of Al
|Dry plasma etch of Al
|Sputtering of Al - pure physical etch
|Sputtering of Al - pure physical etch.
|-
|-


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!Etch rate range
!Etch rate range
|
|
*~100nm/min (pure Al)
*~60-100nm/min
|
|
*~60nm/min (Al+1.5% Si)
*~30nm/min (pure Al)
|
*~0.5nm/min (pure Al)
|
|
*~350 nm/min (depending on features size and etch load)  
*~350 nm/min (depending on features size and etch load)  
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|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!Etch profile
!Etch profile
|
*Isotropic
|
|
*Isotropic
*Isotropic
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!Substrate size
!Substrate size
|
|
*<nowiki>#</nowiki>1-25 100 mm wafers
*100 mm wafers (in bath)
|
*150 mm wafers (in bath)
*<nowiki>#</nowiki>1-25 100 mm wafers
*Any size (in beaker)
|
|
*?
*Chips (6-60 mm)
*100 mm wafers
*150 mm wafers
|
|
*smaller pieces on a carrier wafer
*smaller pieces on a carrier wafer
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|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!'''Allowed materials'''
!'''Allowed materials'''
|In 'Aluminium Etch' bath:
*See Cross Contamination Sheet for [http://labmanager.dtu.dk/function.php?module=XcMachineaction&view=edit&MachID=381 Aluminium Etch] bath (require login)
In beaker:
*Any material
|
|
*Aluminium
*Every thing that is allowed in the Developer: TMAH Manual
*Silicon
*Silicon Oxide
*Silicon Nitride
*Silicon Oxynitride
*Photoresist
*E-beam resist
|
*Aluminium
*Silicon
*Silicon Oxide
*Silicon Nitride
*Silicon Oxynitride
*Photoresist
*E-beam resist
|
|
|
*Silicon
*Silicon
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