Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano14: Difference between revisions
| (5 intermediate revisions by 2 users not shown) | |||
| Line 1: | Line 1: | ||
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/nanoetch/nano14 click here]''' | |||
<!--Checked for updates on 30/7-2018 - ok/jmli --> | |||
<!--Checked for updates on 5/10-2020 - ok/jmli --> | |||
== The nano1.4 recipe == | == The nano1.4 recipe == | ||
{{Template:Author-jmli1}} | |||
<!--Checked for updates on 2/02-2023 - ok/jmli --> | |||
{| border="2" cellpadding="2" cellspacing="1" | {| border="2" cellpadding="2" cellspacing="1" | ||
| Line 44: | Line 52: | ||
C4F8 75 sccm, SF6 38 sccm, 4 mTorr, Strike 3 secs @ 15 mTorr, 800 W CP, 50 W PP, -20 degs, 120 secs | C4F8 75 sccm, SF6 38 sccm, 4 mTorr, Strike 3 secs @ 15 mTorr, 800 W CP, 50 W PP, -20 degs, 120 secs | ||
</gallery> | </gallery> | ||
{| {{table}} | |||
| align="center" style="background:#f0f0f0;"|'''Nominal trench line width''' | |||
| align="center" style="background:#f0f0f0;"|'''''' | |||
| align="center" style="background:#f0f0f0;"|'''30''' | |||
| align="center" style="background:#f0f0f0;"|'''60''' | |||
| align="center" style="background:#f0f0f0;"|'''90''' | |||
| align="center" style="background:#f0f0f0;"|'''120''' | |||
| align="center" style="background:#f0f0f0;"|'''150''' | |||
| align="center" style="background:#f0f0f0;"|'''Average''' | |||
| align="center" style="background:#f0f0f0;"|'''Std. dev.''' | |||
|- | |||
| Etch rates||nm/min||168||182||185||189||191||183||9 | |||
|- | |||
| Sidewall angle||degs||91||91||91||91||90||91||0 | |||
|- | |||
| CD loss||nm/edge||7||-3||-3||-25||-26||-10||15 | |||
|- | |||
| CD loss foot||nm/edge||12||9||10||-11||1||4||9 | |||
|- | |||
| Bowing||||9||6||4||5||7||6||2 | |||
|- | |||
| Bottom curvature||||-47||-34||-34||-26||-19||-32||10 | |||
|- | |||
| zep||nm/min||||||||||||67|| | |||
|- | |||
| | |||
|} | |||
Latest revision as of 15:17, 2 February 2023
Feedback to this page: click here
The nano1.4 recipe
Unless otherwise stated, all content on this page was created by Jonas Michael-Lindhard, DTU Nanolab
| Recipe | Gas | C4F8 75 sccm, SF6 38 sccm |
|---|---|---|
| Pressure | 4 mTorr, Strike 3 secs @ 15 mTorr | |
| Power | 800 W CP, 50 W PP | |
| Temperature | -20 degs | |
| Hardware | 100 mm Spacers | |
| Time | 120 secs | |
| Conditions | Run ID | 2000 |
| Conditioning | Sequence: Oxygen clean, MU tests, processes, no oxygen between runs | |
| Mask | 211 nm zep etched down to 77 nm |
- The results of the nano1.4 recipe
-
The 30 nm trenches -
The 60 nm trenches -
The 90 nm trenches -
The 120 nm trenches -
The 150 nm trenches
| Nominal trench line width | ' | 30 | 60 | 90 | 120 | 150 | Average | Std. dev. |
| Etch rates | nm/min | 168 | 182 | 185 | 189 | 191 | 183 | 9 |
| Sidewall angle | degs | 91 | 91 | 91 | 91 | 90 | 91 | 0 |
| CD loss | nm/edge | 7 | -3 | -3 | -25 | -26 | -10 | 15 |
| CD loss foot | nm/edge | 12 | 9 | 10 | -11 | 1 | 4 | 9 |
| Bowing | 9 | 6 | 4 | 5 | 7 | 6 | 2 | |
| Bottom curvature | -47 | -34 | -34 | -26 | -19 | -32 | 10 | |
| zep | nm/min | 67 | ||||||