Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon/Boron doped poly-Si: Revision history

30 January 2023

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26 January 2023

• curprev 15:4515:45, 26 January 2023‎ Pevo talk contribs‎ 3,597 bytes +2‎ →‎Important notes about deposition of boron doped polysilicon
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• curprev 14:5214:52, 26 January 2023‎ Pevo talk contribs‎ 2,168 bytes +1,097‎ No edit summary
• curprev 14:2614:26, 26 January 2023‎ Pevo talk contribs‎ 1,071 bytes +1,071‎ Created page with " ==Results from the acceptance test 2012== {| border="2" cellspacing="1" cellpadding="8" !Recipe name !Deposition rate [nm/min] !Refractive index@630nm !Thickness variation on center wafer !Thickness variation along the boat !Surface roughness [nm] !Sheet resistance [Ohms/square] !Boron concentation [boron atoms/cm³] !Comments |- |"DOPEPOLY" |~ 4.0-4.1 (4" wafers) | 1.29%-1.38% (4" wafers) | 1.63%-1.81% (4" wafers) | |~ 4.83, measured with AFM standard tip..."