Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using Plasma Asher: Revision history

3 February 2023

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18 August 2021

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28 January 2019

• curprev 10:5610:56, 28 January 2019‎ Bghe talk contribs‎ 1,998 bytes +36‎ →‎SiO2 can be etched in the Plasma Asher using CF4

5 August 2016

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27 June 2016

• curprev 15:4815:48, 27 June 2016‎ Bghe talk contribs‎ 1,961 bytes −3‎ →‎SiO2 can be etched in the Plasma Asher using CF4

23 January 2014

• curprev 09:5609:56, 23 January 2014‎ Bghe talk contribs‎ 1,964 bytes +14‎ →‎SiO2 can be etched in the Plasma Asher using CF4
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• curprev 08:2508:25, 23 January 2014‎ Bghe talk contribs‎ 1,550 bytes +448‎ →‎SiO2 can be etched in the Plasma Asher using CF4

22 January 2014

• curprev 15:5915:59, 22 January 2014‎ Bghe talk contribs‎ 1,102 bytes +130‎ →‎SiO2 can be etched in the Plasma Asher using CF4
• curprev 15:5215:52, 22 January 2014‎ Bghe talk contribs‎ 972 bytes +16‎ →‎SiO2 can be etched in the Plasma Asher using CF4
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• curprev 15:5015:50, 22 January 2014‎ Bghe talk contribs‎ 956 bytes 0‎ →‎SiO2 can be etched in the Plasma Asher using CF4
• curprev 15:5015:50, 22 January 2014‎ Bghe talk contribs‎ 956 bytes +14‎ →‎SiO2 can be etched in the Plasma Asher using CF4
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• curprev 15:4715:47, 22 January 2014‎ Bghe talk contribs‎ 958 bytes +92‎ →‎SiO2 can be etched in the Plasma Asher using CF4
• curprev 15:4515:45, 22 January 2014‎ Bghe talk contribs‎ 866 bytes −9‎ →‎SiO2 can be etched in the Plasma Asher using CF4
• curprev 15:3015:30, 22 January 2014‎ Bghe talk contribs‎ 875 bytes +313‎ No edit summary
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• curprev 15:2515:25, 22 January 2014‎ Bghe talk contribs‎ 196 bytes +196‎ Created page with "==SiO2 can be etched in the Plasma Asher using CF4== ''Test work done January 2014 by BeritG. Hesrtrøm @Danchip'' SiO2 can be etched in the Plasma Asher using CF4. This giv..."