Specific Process Knowledge/Thermal Process/Dope with Phosphorus: Revision history

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curprev 11:4311:43, 25 November 2015‎ Kabi talk contribs‎ 6,495 bytes +132‎ →‎Doping profile after Phosphorus Predep process
curprev 11:3511:35, 25 November 2015‎ Kabi talk contribs‎ 6,363 bytes +4‎ →‎Process parameters
curprev 11:3311:33, 25 November 2015‎ Kabi talk contribs‎ 6,359 bytes +1,095‎ No edit summary
curprev 10:5110:51, 25 November 2015‎ Kabi talk contribs‎ 5,264 bytes +53‎ No edit summary

curprev 08:5308:53, 19 May 2014‎ Mdyma talk contribs‎ 5,211 bytes +157‎ →‎Results

curprev 12:3412:34, 11 October 2013‎ Pevo talk contribs‎ 4,290 bytes +226‎ No edit summary

curprev 14:5714:57, 19 March 2013‎ Mdyma talk contribs‎ 4,064 bytes +234‎ →‎Test measurement

curprev 14:4714:47, 22 February 2013‎ Mdyma talk contribs‎ 466 bytes +238‎ →‎In preparation

curprev 13:2713:27, 26 November 2012‎ Mdyma talk contribs‎ 228 bytes +8‎ No edit summary
curprev 13:2613:26, 26 November 2012‎ Mdyma talk contribs‎ 220 bytes +22‎ No edit summary

curprev 10:5410:54, 26 January 2009‎ Yg talk contribs‎ 198 bytes +10‎ No edit summary
curprev 10:5310:53, 26 January 2009‎ Yg talk contribs‎ 188 bytes +188‎ New page: The furnace A4 phosphorus predep can be used to predeposit silicon wafers with phosphor. The silicon wafers are positioned in a quarts boat. Phosphor is predeposited in the silicon wafers.

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