View source for Specific Process Knowledge/Characterization/AFM: Atomic Force Microscopy/AFM Icon Acceptance

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=AFM Icon 1 accessories and acceptance test=
==Accessories following the system [[Image:section under construction.jpg|70px]] ==
{| border="2" cellspacing="0" cellpadding="2" 

!border="none" style="background:silver; color:black;" align="center"|Equipment 
|style="background:WhiteSmoke; color:black"|<b>AFM Icon</b>
|style="background:WhiteSmoke; color:black"|<b>AFM Icon 2</b>

|-
!style="background:silver; color:black;" align="left"|Chucks
|style="background:WhiteSmoke; color:black"|
*A symmetric chuck that handles up to 210mm wafers and 15mm thick
*An asymmetric chuck that handles up to ~4" wafer (but not small pieces) - using this a whole 4" can be accessed without rotating the sample. 
|style="background:WhiteSmoke; color:black"|
*A symmetric chuck that handles up to 210mm wafers and 15mm thick
|-
!style="background:silver; color:black;" align="left"|Holders
|style="background:WhiteSmoke; color:black"|
*Magnetic sample holder + magnetic discs + double sided tape
*Holder for vertical profile scans
|style="background:WhiteSmoke; color:black"|
*Magnetic sample holder + magnetic discs + double sided tape
*Holder for vertical profile scans ?

|-
!style="background:silver; color:black" align="left"|Modes included
|style="background:WhiteSmoke; color:black"|
*ScanAsyst
*TappingMode (air)
*Contact Mode
*Lateral Force Microscopy
*PhaseImaging
*Lift mode
*MFM
*Force Spectroscopy
*Force volume
*EFM
*surface potential
*Torsional Resonance Mode
*Piezoresponse Microscopy
*Force spectroscopy


'''Extra modes:'''

*PeakForce KPFM package (incl extra box for high voltage PF KPFM)
*PFQNM package
*Microscope Image Registration and Overlay (MIRO) software. '''this is only working in the old software (before version 9.4)'''

|style="background:WhiteSmoke; color:black"|
*ScanAsyst
*TappingMode (air)
*Contact Mode
*Lateral Force Microscopy
*PhaseImaging
*Lift mode
*MFM
*Force Spectroscopy
*Force volume
*EFM
*surface potential
*Torsional Resonance Mode
*Piezoresponse Microscopy
*Force spectroscopy


|-
|style="background:silver; color:black"|Probes that followed the systems
|style="background:WhiteSmoke; color:black"| 
{|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" 
|-

|-
|-style="background:silver; color:black"
!
!ScanAsyst mode
!Tapping mode
!Contact mode
!PF-KPFM
|-

|-
|-style="background:WhiteSmoke; color:black"
!Generel description
|Generel description
|Generel description
|
|
|-

|-
|-style="background:LightGrey; color:black"
!Probes that followed the system
|
*ScanAsyst air 30ps
*ScanAsyst fluid 10ps
*ScanAsyst fluid + 10ps
|
*MPP-11100-10
*MPP-21100-10
*MPP-11120-10 RTESPA
*TESPA-V2 10ps
*OTESPA-R3 10ps
*High Aspect ratio probes 1:15: FIB6-400A 5ps
*MPP-12120 10ps.  Tap150A
*MPP-13120-10 TAP525A
|
*SNL-10 20ps
|
*SCM-PIT 10ps
*PFQNE-Al 10ps
|-
|}

|style="background:WhiteSmoke; color:black"|
{|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" 
|-

|-
|-style="background:silver; color:black"
!
!ScanAsyst mode
!Tapping mode
!Contact mode
|-

|-
|-style="background:WhiteSmoke; color:black"
!Generel description
|Generel description
|Generel description
|
|-

|-
|-style="background:LightGrey; color:black"
!Probes that followed the system
|
*ScanAsyst air 30ps
*ScanAsyst fluid 10ps
*ScanAsyst fluid + 10ps
|
*MPP-11100-10
*MPP-21100-10
*MPP-11120-10 RTESPA
*TESPA-V2 10ps
*OTESPA-R3 10ps
*MPP-12120 10ps.  Tap150A
*MPP-13120-10 TAP525A
|
*SNL-10 20ps

|-
|}

|-
|style="background:silver; color:black"|
|style="background:WhiteSmoke; color:black"|<30pm RMS
|style="background:WhiteSmoke; color:black"|<30pm RMS
|-
|style="background:silver; color:black"|
|style="background:WhiteSmoke; color:black"|<0.15nm RMS
|style="background:WhiteSmoke; color:black"|<0.15nm RMS
|-
|style="background:silver; color:black"|
|style="background:WhiteSmoke; color:black"|35pm RMS 
|style="background:WhiteSmoke; color:black"|35pm RMS 
|-
|style="background:silver; color:black"|
|style="background:WhiteSmoke; color:black"|<0.5%
|style="background:WhiteSmoke; color:black"|<0.5%
|-
|style="background:silver; color:black"|
|style="background:WhiteSmoke; color:black"|<0.15nm RMS
|style="background:WhiteSmoke; color:black"|<0.15nm RMS
|-
|style="background:silver; color:black"|
|style="background:WhiteSmoke; color:black"|~1 for our standard probe. Can be improved to about 10 with the right probe
|style="background:WhiteSmoke; color:black"|~1 for our standard probe. Can be improved to about 10 with the right probe
|-
!style="background:silver; color:black" align="left"|Hardware settings
|style="background:WhiteSmoke; color:black"|Standard probe: <12 nm
|style="background:WhiteSmoke; color:black"|Standard probe: <12 nm
|-
|style="background:silver; color:black"|
|style="background:WhiteSmoke; color:black"|[http://www.brukerafmprobes.com/p-3726-scanasyst-air.aspx ScanAsyst in Air]
|style="background:WhiteSmoke; color:black"|[http://www.brukerafmprobes.com/p-3726-scanasyst-air.aspx ScanAsyst in Air]
|-
|style="background:silver; color:black"|
|style="background:WhiteSmoke; color:black"|[http://www.nanoandmore.com/AFM-Probe-Tap300Al-G.html Tap300Al-G]
|style="background:WhiteSmoke; color:black"|[http://www.nanoandmore.com/AFM-Probe-Tap300Al-G.html Tap300Al-G]
|-
|style="background:silver; color:black"|
|style="background:WhiteSmoke; color:black"|[http://www.nanoandmore.com/AFM-Probe-SSS-NCHR.html SSS-NCHR]
|-
|style="background:silver; color:black"|
|style="background:WhiteSmoke; color:black"|[http://www.nanoandmore.com/AFM-Probe-AR5-NCHR.html AR5-NCHR]
|style="background:WhiteSmoke; color:black"|[http://www.nanoandmore.com/AFM-Probe-AR5-NCHR.html AR5-NCHR]
|-
|style="background:silver; color:black"|
|style="background:WhiteSmoke; color:black"|
*[http://www.brukerafmprobes.com Bruker]
*[http://www.nanoandmore.com/home.php www.nanoandmore.com]
|style="background:WhiteSmoke; color:black"|
*[http://www.brukerafmprobes.com Bruker]
*[http://www.nanoandmore.com/home.php www.nanoandmore.com]
|- 
|-
!style="background:silver; color:black" align="left"|Substrates
|style="background:WhiteSmoke; color:black"|Up to 210mm in diameter and up to 15mm thick"
|style="background:WhiteSmoke; color:black"|Up to 210mm in diameter and up to 15mm thick"
|-
!style="background:silver; color:black" align="left"|
|style="background:WhiteSmoke; color:black"|
*180mmx150mm inspection area
*2µm repeatability, unidirectional
*3µm repeatability, bidirectional
|style="background:WhiteSmoke; color:black"|
*180mmx150mm inspection area
*2µm repeatability, unidirectional
*3µm repeatability, bidirectional
|-
|style="background:silver; color:black"|
|style="background:WhiteSmoke; color:black"|In principle all materials
|style="background:WhiteSmoke; color:black"|In principle all materials
|-
|}

<br clear="all" />

===Extra chuck===

'''We have two chucks:'''

*A symmetric chuck that handles up to 210mm wafers and 15mm thick

*An asymmetric chuck that handles up to ~4" wafer (but not small pieces) - using this a whole 4" can be accessed without rotating the sample. 

 

===Holders===

*Magnetic sample holder + magnetic discs + double sided tape
*Holder for vertical profile scans



===Modes included===

*ScanAsyst
*TappingMode (air)
*Contact Mode
*Lateral Force Microscopy
*PhaseImaging
*Lift mode
*MFM
*Force Spectroscopy
*Force volume
*EFM
*surface potential
*Torsional Resonance Mode
*Piezoresponse Microscopy
*Force spectroscopy


'''Extra modes:'''

*PeakForce KPFM package (incl extra box for high voltage PF KPFM)
*PFQNM package
*Microscope Image Registration and Overlay (MIRO) software. '''this is only working in the old software (before version 9.4)'''

===Probes===

Probes that followed the system (we may not have them anymore!)

{|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" 
|-

|-
|-style="background:silver; color:black"
!
!ScanAsyst mode
!Tapping mode
!Contact mode
!PF-KPFM
|-

|-
|-style="background:WhiteSmoke; color:black"
!Generel description
|Generel description
|Generel description
|
|
|-

|-
|-style="background:LightGrey; color:black"
!Probes that followed the system
|
*ScanAsyst air 30ps
*ScanAsyst fluid 10ps
*ScanAsyst fluid + 10ps
|
*MPP-11100-10
*MPP-21100-10
*MPP-11120-10 RTESPA
*TESPA-V2 10ps
*OTESPA-R3 10ps
*High Aspect ratio probes 1:15: FIB6-400A 5ps
*MPP-12120 10ps.  Tap150A
*MPP-13120-10 TAP525A
|
*SNL-10 20ps
|
*SCM-PIT 10ps
*PFQNE-Al 10ps
|-
|}

<br clear="all" />

===Samples===

*QC grid: VGRP-15M 10µm pitch and depth reference 178nm
*PF KPFM-SMPL Kelvin probe Sample: Al + Au on Si 

'''Calibration samples for getting quantitative modulus measurements:'''

#PDMS-soft-1-12M: PDMS gel 2.5MPa
#PDMS-soft-2-12M: PDMS gel 3.5MPa
#PSFilm-12M: Polystyrene filem
#FSilica-12M: Fused Silica
#Sapphire-12M: Sapphire
#RS-12M: Ti roughness sample
#HOPG-12M: Highly Orientated Pyrolytic Graphite
#PS-LDPE: Harmonix training


*HOPG: Highly Oriented Pyrolytic Graphite

==Acceptance tests done==

===Noise tests===
====Sensor noise====
Tappingmode, OTESPA-R3 probe used. <br>
First we made a false engage (scanning in air):
Turn off gain 0 0 <br>
Z range 0.2my <br>
Scan size 0.01nm <br>
We saw some 50Hz noise (electrical - or maybe pumps): Rq 15 pm (specs 35pm) <br>
[[File:SensorNoise.jpg|thumb|left|400px]] <br clear="all" />

====System noise====
Noise on sample: scan size 0.1nm <br>
we started with 1my scan size to optimize the scan. <br>
2.43Hz <br>
256 lines <br>
Z range at 2my to get sub nanometer resolution in Z <br>
Rq: 54,5pm (plade vibrator koerte udenfor)  <br>
Rq: 23pm uden vibrator koerende + ro og med aaben hood. <br>
Rq:71pm uden vibrator koerende + ro og med lukket hood <br>
[[File:SystemNoise.jpg|thumb|left|400px]][[File:systemNoise_open_closed_hood.jpg|thumb|left|400px]]
<br clear="all" />

===Roughness===
[[File:ACPT roughness.jpg|800px]]

===HAR: 200nm wide 400nm deep===
[[File:200nm wide 400nm deep.jpg|800px]]

===HAR: 2µm wide 6µm deep===

===Graphene KPFM measurement===
[[File:AFM Icon KPFM1.jpg|800px]][[File:AFM Icon KPFM2.jpg|440px]]<br>
Height image: The graphene and structuring in graphene is not visible <br>
Potential image: Potential difference between grapheme and non-graphene is visible <br> 
Phase: Phase imaging maps the phase lag between the periodic signal driving the cantilever and the oscillations of the cantilever. Changes in phase lag often indicate changes in the properties of the sample surface. Here the structuring in the graphene is very clear

=AFM Icon 2 accessories and acceptance test=