Deletion log

Below is a list of the most recent deletions.

12:28, 14 April 2026 Mmat talk contribs deleted page Specific Process Knowledge/Lithography/mrEBL6000 (content before blanking was: " mrEBL6000 works as a negative e-beam resist but is also UV sensitive, why resist and coated wafers should be kept in yellow rooms only. When carrying the wafers to the e-beam writer, use a black or blue box for protection. While mounting the wafers in the e-beam cassettes, you can turn off the white light in the e-beam room and turn on the yellow light which is located above the pre-aligner setup. Please mount as close to exposure as possible and turn of...")
12:28, 14 April 2026 Mmat talk contribs deleted page Specific Process Knowledge/Lithography/EBeamLithographyManual (content before blanking was: "= Purpose, location and technical specifications = The JEOL JBX-9500FS electron beam lithography system is a spot electron beam lithography system designed for use in writing patterns with dimensions from nanometers to sub-micrometers. Substrates that needs e-beam exposure should be mounted in a cassette and transferred into the writer via the robot loader (autoloader). To request for an e-beam training session, contact e-beam@nanolab.dtu.dk; a DTU Nanolab...")
12:49, 7 April 2026 Bghe talk contribs deleted page Specific Process Knowledge/Characterization/SEM Gemini 1/ma (content before blanking was: "Technical specification Sample requirements Any sample allowed in the cleanroom can be imaged in Gemini 1. If you have any questions, please consult the persons responsible for the SEM. Sample sizes: Up to 8" wafers (the ranges on the X and Y axes only provide full view of a 6" wafer) Vacuum modes: The SEM is usually operated in high vacuum (HV) mode where the chamber pressure is somewhere in the 2*10-4 to 10-6 mbar range. For imaging of non-conducting sa...")
12:49, 7 April 2026 Bghe talk contribs deleted page Specific Process Knowledge/Etch/DRIE-Pegasus/FAQ/Potasi (content before blanking was: "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/FAQ/Potasi click here]'''   {{Template:Author-jmli1}}  ; Question : We have had several requests on etches that produce slop...")
12:48, 7 April 2026 Bghe talk contribs deleted page Specific Process Knowledge/Etch/DRIE-Pegasus/FAQ/Nanoetch (content before blanking was: "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/FAQ/Nanoetch click here]'''   ''Unless otherwise stated, all content on this page was created by Berit Geilmann Herstrøm, DTU Nanolab'' <!--Checked for updates on 2/02-2023...")
12:48, 7 April 2026 Bghe talk contribs deleted page Specific Process Knowledge/Etch/DRIE-Pegasus/FAQ/Matching (content before blanking was: "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/FAQ/Matching click here]'''   ; Question 1 :Last Friday I ran the first nanoetches with the recipe below - with limited success however. I was short on time so I couldn't...")
12:47, 7 April 2026 Bghe talk contribs deleted page Specific Process Knowledge/Etch/DRIE-Pegasus/FAQ/Bonding (content before blanking was: "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/FAQ/Bonding click here]'''   ; Question 1 : A user tried to etch through a wafer using a carrier and crystalbond as medium (see image below). Even though he ran the standard...")
12:47, 7 April 2026 Bghe talk contribs deleted page Specific Process Knowledge/Etch/DRIE-Pegasus/FAQ/Masks (content before blanking was: "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/FAQ/Masks click here]'''   ; Question 1 : I remember you said that you don't like Al as masking material because it will get sputtered off (am I right?) - but what about AL...")
12:41, 7 April 2026 Bghe talk contribs deleted page Specific Process Knowledge/Characterization/SEM Gemini 1/use (content was: " Detectors Se2 Inlens Inlens ESB BSD1 VPSE STEM High vacuum Low vacuum NanoVP XVP {| class="wikitable" |+ Caption text |-esb ! Detectors !! Se2 !! Inlens !! Inlens ESB !! BSD1 !! VPSE !! STEM !! Header text |- ! High vacuum || Yes || Yes ||Yes|| Yes || Example || Example || Example |- ! Low vacuum || Example || Example || Example || Example || Example ||...", and the only contributor was "Jmli" (talk))
12:37, 7 April 2026 Bghe talk contribs deleted page Specific Process Knowledge/Characterization/Optical microscope/Nikon Eclipse L200 auto scan guide (content before blanking was: "<!-- The Nikon Eclipse L200 series mikroscopes can autoscan a wafer to image the entire wafer. The mini guide below shows one way of setting this up. The guide is setup for a full wafer scan of a 6" wafer which takes app. 4-6 hours to scan and gives app. 5000 images of 3-4MB each (at 10x Objective), hence fills a lot of storage. It is recommended to '''store the data on the temporary folder''' in the C-drive and '''move the images (e.g., to the cleanroom drive)...")
12:36, 7 April 2026 Bghe talk contribs deleted page Specific Process Knowledge/Lithography/EBeamLithography/RaithPatternPreparation (content was: "= Pattern preparation for exposure on the Raith eLine Plus =", and the only contributor was "Thope" (talk))
12:36, 7 April 2026 Bghe talk contribs deleted page Specific Process Knowledge/Lithography/authors generic (content before blanking was: "")
12:35, 7 April 2026 Bghe talk contribs deleted page Specific Process Knowledge/Lithography/EBeamLithography/JEOL 9500 trouble shooting (content was: "Error messages on the JEOL 9500 system can sometimes be difficult to understand. Hence we have collected a series of the most typical errors users may encounter on the system. They are divided into compilation errors experienced at file compilation and execution errors experienced at job execution. =Compilation errors= To come =Execution errors= To come", and the only contributor was "Thope" (talk))
15:03, 4 February 2026 Bghe talk contribs deleted page Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiO2 Etch/EM with resist mask (content before blanking was: "==Etching SiO2 with DUV resist mask using EM coils== {{CC-bghe2}} *Removing the H2 from the recipe to get less redeposition @ 200W platen power, EM:02/30A <gallery caption="Recipe name: SiO2_res, Recipe no. 10+EM+edit coils: C09975 coil_2500W, platen:200W, EM:02/30A, Pressure:8.8mTorr, C4F8:25.6sccm, He:448.7sccm, H2:0sccm, 3:56 min " perrow="5"> File:C09975_00.jpg File:C09975_02.jpg File:C09975_03.jpg File:C09975_04.jpg File:C09975_05.jpg </gallery>")
09:29, 29 September 2025 Bghe talk contribs deleted page Specific Process Knowledge/Lithography/EBeamLithography/TRACER (content was: "Delete me", and the only contributor was "Thope" (talk))
19:32, 18 September 2025 Mmat talk contribs deleted page Specific Process Knowledge/Lithography/EBL (content was: "all content moved elsewhere", and the only contributor was "Thope" (talk))
14:03, 17 September 2025 Mmat talk contribs undeleted page Specific Process Knowledge/Lithography/EBeamLithography/TRACER (2 revisions)
14:03, 17 September 2025 Mmat talk contribs deleted page Specific Process Knowledge/Lithography/EBeamLithography/RaithElphy (content was: "Delete me")
14:01, 17 September 2025 Mmat talk contribs deleted page Specific Process Knowledge/Lithography/EBeamLithography/JEOL JBX-9500FSZ/SDFJDFIntro (content was: "Delete me", and the only contributor was "Thope" (talk))
14:01, 17 September 2025 Mmat talk contribs undeleted page Specific Process Knowledge/Lithography/EBeamLithography/JEOL JBX-9500FSZ/SDFJDFIntro (25 revisions) (check what links here)
14:01, 17 September 2025 Mmat talk contribs deleted page Specific Process Knowledge/Lithography/EBeamLithography/JEOL JBX-9500FSZ/SDFJDFIntro (content was: "Delete me", and the only contributor was "Thope" (talk))
14:00, 17 September 2025 Mmat talk contribs undeleted page Specific Process Knowledge/Lithography/EBeamLithography/JEOL JBX-9500FSZ/SDFJDFIntro (25 revisions) (check "what links here")
13:59, 17 September 2025 Mmat talk contribs deleted page Specific Process Knowledge/Lithography/EBeamLithography/TRACER (content was: "Delete me", and the only contributor was "Thope" (talk))
13:59, 17 September 2025 Mmat talk contribs deleted page Specific Process Knowledge/Lithography/EBeamLithography/JEOL JBX-9500FSZ/SDFJDFIntro (content was: "Delete me", and the only contributor was "Thope" (talk))
13:59, 17 September 2025 Mmat talk contribs deleted page Specific Process Knowledge/Lithography/EBL/EBLresist (content was: "Delete me", and the only contributor was "Thope" (talk))
16:01, 4 September 2025 Bghe talk contribs deleted page Specific Process Knowledge/Thin Film deposition/ALD/Al2O3 deposition using ALD (content was: "This page needs to be deleted!")
16:01, 4 September 2025 Bghe talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of Germanium/Thermal Ge deposition Wordentec (content was: " Page to be deleted")
15:23, 9 August 2025 Mmat talk contribs deleted page Small MATLAB script (content was: "Content moved, please delete this page!")
14:37, 9 August 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thermal Process/RTP ANNEALSYS (duplicate, there's another page with more or less same name and actual content)
16:49, 3 July 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thermal Process/Oxidation/Oxidation on III-V oxidation furnace (C2) (slated for deletion by PEVO)
22:14, 20 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of Polysilicon//Standard recipes, QC limits and results for the 6" polysilicon furnace (content was: " '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_polysilicon/Deposition_of_polysilicon_using_LPCVD/Standard_recipes,_QC_limits_and_results_for_the_6%22_polysilicon_furnace click here]''' Unless otherwise stated, this page is w...", and the only contributor was "Mmat" (talk))
22:08, 20 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of Polysilicon//Standard recipes, QC limits and results for the 4" polysilicon furnace (content was: " '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_polysilicon/Deposition_of_polysilicon_using_LPCVD/Standard_recipes,_QC_limits_and_results_for_the_4%22_polysilicon_furnace click here]''' Unless otherwise stated, this page is w...", and the only contributor was "Mmat" (talk))
22:08, 20 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of Polysilicon/ (content was: "{{cc-nanolab}} '''Feedback to this page''': '''[mailto:thinfilm@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Silicon_Nitride/Deposition_of_Silicon_Nitride_using_LPCVD) click here]''' ==Deposition of polysilicon using LPCVD== /Standard recipes, QC limits and results for the...", and the only contributor was "Mmat" (talk))
22:08, 20 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of polysilicon/Deposition of polysilicon using LPCVD/Standard recipes, QC limits and results for the 6" polysilicon furnace (content was: " '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_polysilicon/Deposition_of_polysilicon_using_LPCVD/Standard_recipes,_QC_limits_and_results_for_the_6%22_polysilicon_furnace click here]''' Unless otherwise stated, this page is written by DTU Nanolab internal ==Standard recipes on the 6" polysilicon furnace (t...")
22:06, 20 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of polysilicon/Deposition of polysilicon using LPCVD/Standard recipes, QC limits and results for the 4" polysilicon furnace (content was: " '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_polysilicon/Deposition_of_polysilicon_using_LPCVD/Standard_recipes,_QC_limits_and_results_for_the_4%22_polysilicon_furnace click here]''' Unless otherwise stated, this page is written by DTU Nanolab internal ==Standard recipe on the 4" polysilicon furnace (th...")
17:40, 20 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of polysilicon/Deposition of polysilicon using LPCVD (content was: "{{cc-nanolab}} '''Feedback to this page''': '''[mailto:thinfilm@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Silicon_Nitride/Deposition_of_Silicon_Nitride_using_LPCVD) click here]''' ==Deposition of polysilicon using LPCVD== /Standard recipes, QC limits and results for the 4"...", and the only contributor was "Pvl" (talk))
17:03, 20 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of Gold/Roughness of Au (content was: "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Gold/Roughness_of_Au click here]''' ''All contents by DTU Nanolab staff.'' ==Roughness and uniformity of Au layers == '''Experimental''' Au was deposited directly on unprocessed Si wafers (on top of the native oxide), and the deposited layers were thereafter examined w...")
16:53, 20 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of Nickel/Electroplating of nickel (content moved to "Eletcroplating of nickel"-page)
16:36, 20 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of Chromium/Deposition of Chromium (moved to "Roughness of Chromium" (double "Deposition of chromium/Deposition of chromium" was misleading))
22:57, 17 June 2025 Mmat talk contribs undeleted page LabAdviser:General disclaimer (7 revisions) (link at the bottom of the page needs to be changed to "copyright" before this page can be deleted)
22:49, 17 June 2025 Mmat talk contribs deleted page Sputtering of Ti in Wordentec (content was: "to be deleted, contained no valuable information")
22:48, 17 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thin film deposition/Physimeca/Physimeca calibration (content was: "to be deleted, all info moved directoly to Physimeca")
22:43, 17 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Characterization/Profiler/Stylus profiler measurement uncertainty (content was: "to be deleted, info moved to Dektaxt XTA")
22:43, 17 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Characterization/Profiler/Apex software (content was: "to be deleted, all info moved to https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Tencor_P17", and the only contributor was "Reet" (talk))
22:40, 17 June 2025 Mmat talk contribs deleted page Mask spec (content was: "to be deleted ")
15:57, 17 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Lithography/ARN7500 (content was: "Information on AR-N 7500 to come.", and the only contributor was "Thope" (talk))
15:57, 17 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Lithography/EBL/EBLsubstratePrep (content copy: https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/EBeamLithography/EBLsubstratePrep#User_supplied_resists)
14:36, 17 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thin film deposition/B3 Furnace LPCVD TEOS (content was: "#REDIRECT Specific Process Knowledge/Thin film deposition/Furnace LPCVD TEOS", and the only contributor was "Mdyma" (talk))
14:33, 17 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thin film deposition/B4 Furnace LPCVD PolySilicon (content was: "#REDIRECT Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon", and the only contributor was "Mdyma" (talk))
14:33, 17 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of TEOS using LPCVD (content was: "#REDIRECT Specific Process Knowledge/Thin film deposition/Deposition of TEOS/Deposition of TEOS using LPCVD", and the only contributor was "Mdyma" (talk))