Developer: E-beam 02

Developer: E-beam 02 is located in E-4.

Developer: E-beam 02 is a manually operated, single substrate puddle developer. It uses the ZED-N50 or AR 600-50 developers and IPA for rinsing. The substrates are loaded manually one by one into the developer. Developer dispense, puddle time, IPA rinse, and drying is then performed automatically by the equipment.

Training video (for Developer: TMAH Manual, but it is the same model)

The user manual, user APV, and contact information can be found in LabManager - requires login

Process information

All recipes use the following structure:

Pressurize the developer canister
Dispense puddle while rotating substrate slowly
Puddle development while not rotating
Agitate substrate once per 15 seconds by rotating slowly for 1 second
Spin off developer
Clean substrate with IPA
Dry substrate and chamber with nitrogen

Multi-puddle recipes repeat steps 2-5 for the given number of puddles.

Process recipes
N50 recipes have the letter "N" in them. AR-600-50 recipes have the letter "A" in them. The number is the development time in seconds:

01 Rinse
02 N 15
03 N 30
04 N 60
05 N 90
06 N 120
07 N 180
08 N 300
09 N 600
10 N 2x60
11 N 5x60
12 A 15
13 A 30
14 A 60
15 A 90
16 A 120
17 A 180
18 A 300
19 A 600
20 A 2x60
21 A 5x60

Equipment performance and process related parameters

Purpose		Development of: CSAR ZEP520A
Developer		AR 600-50 ZED N-50
Method	Development	Puddle
Method	Handling	Chip chuck for chips Non-vacuum chuck for 2" wafers Non-vacuum chuck for 100 mm and 150 mm wafers Non-vacuum chuck for 200 mm wafers
Process parameters	Temperature	Room temperature
	Agitation	1 second rotational agitation at 30 rpm every 15 seconds
	Rinse	IPA
Substrates	Substrate size	Chips 2" wafers 100 mm wafers 150 mm wafers 200 mm wafers
	Allowed materials	All cleanroom approved materials Film, or pattern, of all materials except Type IV
	Batch size	1