Specific Process Knowledge/Lithography/Coaters/labspin05

Spin Coater: LabSpin 05

Spin coater: LabSpin 05 is located in PolyFabLab in building 347

Spin Coater: LabSpin 05 is a model LabSpin6 TT spin coater from SUSS. It's primary purpose is spin coating of SU-8 resist and EBR (Edge Bead Removal) of resist on round substrates. The EBR nozzle is either fixed for 4" or 6" wafers, depending on the user's request, as it needs manual adjustment. It was installed in PolyFabLab in 2026.

The user manual, user APV, and contact information can be found in LabManager - requires login

Training video (same tool in Cleanroom 346): LabSpin02 + 03

Process information

Useful information about resist dispense can be found here.

Equipment performance and process related parameters

Purpose		Spin coating of epoxy-based resists SU-8 series SU-8 3000 series SU-8 XFT series mr-DWL series Spin coating of other resists EBR of round substartes
Resist		manual dispense
Performance	Coating thickness	SU-8 resists: 0.1-200 µm Coating thickness range is dependent on specific resist formulation
Process parameters	Spin speed	100 - 8000 rpm
	Spin acceleration	200 - 4000 rpm/s (wrongly labelled 1/s^2 in the software)
Substrates	Substrate size	chips, 5mm and up 100 mm wafers 150 mm wafers
	Allowed materials	All PolyFabLab materials See Cross Contamination Sheet in LabManager
	Batch	1