Plasma Asher 5

Product name: PVA Tepla Gigabatch 380M
Year of purchase: 2024

The Plasma Asher 5 can be used for the following processes:

Photoresist stripping
Descumming
Surface cleaning
Removal of organic passivation layers and masks

Furthermore plasma processing using CF₄ in plasma asher 5 can be used for:

Etching of glass and ceramic
Etching of SiO₂, Si₃N₄, Si
Removal of polyimide layers

Plasma asher 5 can be used for almost every material, but if you have any doubt if your materials are compatible/allowed in plasma asher 5, feel free to ask the lithography group at Nanolab.

The user manual, risk assessment, and contact information can be found in LabManager - requires login

Process Information

Plasma asher 5 is identical to plasma asher 4, see resist strip processing for plasma asher 4 here.

Processes specifically only for plasma asher 5: