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- 12:18, 31 January 2023 Mfarin talk contribs uploaded File:Esq met Al2O3 only (1).png (File uploaded with MsUpload)
- 12:17, 31 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/TIspray (Created page with "{{:Specific Process Knowledge/Lithography/authors_generic}} '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/5214E click here]''' Resist AZ 5214E __TOC__ =Resist Description= TI Spray is specifically designed to be used for spray coating, and is a positive UV photoresist with image revers...")
- 12:15, 31 January 2023 Mfarin talk contribs created page File:Esq met Al2O3 only.png (File uploaded with MsUpload)
- 12:15, 31 January 2023 Mfarin talk contribs uploaded File:Esq met Al2O3 only.png (File uploaded with MsUpload)
- 12:06, 31 January 2023 Jmli talk contribs created page Template:Nexsa-addpubrow (Created page with "| [https://labmanager.dtu.dk/view_binary.php?fileId={{{LMdocID}}} {{{LMdocTitle}}} |{{{LMdocType}}} |{{{LMdocAuthor}}} |{{{docLink}}} |{{{XPSused}}} |{{{UPSused}}} |{{{ISSused}}} |{{{REELSused}}} |{{{Ramanused}}} |{{{AdditionalOption}}} |{{{Sample}}} |{{{Abstract}}} |-")
- 12:03, 31 January 2023 Thope talk contribs created page File:BoundingBoxAlign.png (File uploaded with MsUpload)
- 12:03, 31 January 2023 Thope talk contribs uploaded File:BoundingBoxAlign.png (File uploaded with MsUpload)
- 12:01, 31 January 2023 Jehem talk contribs uploaded a new version of File:AZ photoresists spectral sensitivity - remake v1.png
- 11:57, 31 January 2023 Jmli talk contribs created page Template:Nexsa-tableheader (Created page with "{| border="2" cellspacing="0" cellpadding="1" {{table}} | align="center" style="background:#f0f0f0;" colspan="4"|'''Publication''' | align="center" style="background:#f0f0f0;" colspan="6"|'''Techniques and hardware applied''' | align="center" style="background:#f0f0f0;" rowspan="2"|'''Sample types/Materials''' | align="center" style="background:#f0f0f0;" rowspan="2"|'''Abstract: Hover cursor to show''' |- | align="center" style="background:#f0f0f0;" |'''Title (The link r...")
- 10:43, 31 January 2023 Thope talk contribs created page File:BoundingBox.png (File uploaded with MsUpload)
- 10:43, 31 January 2023 Thope talk contribs uploaded File:BoundingBox.png (File uploaded with MsUpload)
- 10:39, 31 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/authors generic (Created page with "''This section is written by DTU Nanolab staff, unless otherwise stated.''")
- 09:02, 31 January 2023 Jmli talk contribs created page Template:Author-jmli1 (Created page with "''This page was written by Jonas Michael-Lindhard, DTU Nanolab ''<br>")
- 17:25, 30 January 2023 Thope talk contribs created page File:RoughFineScan.png (File uploaded with MsUpload)
- 17:25, 30 January 2023 Thope talk contribs uploaded File:RoughFineScan.png (File uploaded with MsUpload)
- 16:43, 30 January 2023 Thope talk contribs created page File:9500AlignmentMarks.png (File uploaded with MsUpload)
- 16:43, 30 January 2023 Thope talk contribs uploaded File:9500AlignmentMarks.png (File uploaded with MsUpload)
- 16:13, 30 January 2023 Indiogo talk contribs created page File:Dissertation ID Rapid Thermal Processing and its Effects on High Aspect Ratio Silicon Features.pdf (File uploaded with MsUpload)
- 16:13, 30 January 2023 Indiogo talk contribs uploaded File:Dissertation ID Rapid Thermal Processing and its Effects on High Aspect Ratio Silicon Features.pdf (File uploaded with MsUpload)
- 16:13, 30 January 2023 Indiogo talk contribs created page File:Report Annealsys 2022.pdf (File uploaded with MsUpload)
- 16:13, 30 January 2023 Indiogo talk contribs uploaded File:Report Annealsys 2022.pdf (File uploaded with MsUpload)
- 15:46, 30 January 2023 Thope talk contribs created page File:JEOL9500Alignment.png (File uploaded with MsUpload)
- 15:46, 30 January 2023 Thope talk contribs uploaded File:JEOL9500Alignment.png (File uploaded with MsUpload)
- 12:27, 30 January 2023 Thope talk contribs created page Specific Process Knowledge/Lithography/EBeamLithography/RaithPatternPreparation (Created page with "= Pattern preparation for exposure on the Raith eLine Plus =")
- 12:26, 30 January 2023 Thope talk contribs created page Specific Process Knowledge/Lithography/EBeamLithography/JEOLPatternPreparation (Created page with "=Pattern preparation for exposure on JEOL 9500 =")
- 12:08, 30 January 2023 Bghe talk contribs deleted page Specific Process Knowledge/Lithography/EBeamLithography/Developer E-beam (Request from Thomas Pedersen)
- 11:52, 30 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Development/DUV developer (Created page with "=Developer: TMAH Stepper = 300x300px|right|thumb|The Developer-TMAH-Stepper is placed in F-3 This developer is dedicated for development of DUV resists. The developer is fully automatic and can run up to 25 substrates in a batch 4", 6", and 8" size (8" requires tool change). The machine is equipped with 1 developer line, in our case 2,38% TMAH in water (AZ 726 MIF), 1 topside rinse line with water, 1 backside rinse line with water and 1 N2 line f...")
- 11:28, 30 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Coaters/Spin Coater: Gamma DUV processing (Created page with "=General Process Information= Processing using Spin Coater: Süss stepper is divided into two parts: *Spin coating *Soft baking ==Spin coating== The process of spin coating on Spin Coater: GSüss stepper consists of a selection of the following steps: *Acceleration to a low spin speed if dynamic dispense is used *Resist dispense *Spin-off The wafer is first centered on the spindle chuck and held in place by vacuum. If static dispense is specified in the process, the sp...")
- 11:27, 30 January 2023 Indiogo talk contribs created page File:Test samples.png
- 11:27, 30 January 2023 Indiogo talk contribs uploaded File:Test samples.png
- 11:25, 30 January 2023 User account Mirmus talk contribs was created automatically
- 11:19, 30 January 2023 Thope talk contribs created page Specific Process Knowledge/Lithography/EBeamLithography/ResistBottles (Created page with "= User resist bottles in the cleanroom = 150px|right We recommend all groups or users to have their own bottle of e-beam resist inside the cleanroom. Please follow the guidelines below. * Find a blue-capped glass bottle in the cupboard next to office 055 in 346 (outside the cleanroom). * Bring the bottle inside gowning; clean it thoroughly '''on the outside''' with water or alcohol * Bring the bottle to a fumehood inside the cleanroom; clean the b...")
- 11:08, 30 January 2023 Thope talk contribs created page File:RejectedSamples.png (File uploaded with MsUpload)
- 11:07, 30 January 2023 Thope talk contribs uploaded File:RejectedSamples.png (File uploaded with MsUpload)
- 10:08, 30 January 2023 Pevo talk contribs created page File:Boron doped polySi.jpg
- 10:08, 30 January 2023 Pevo talk contribs uploaded File:Boron doped polySi.jpg
- 15:15, 28 January 2023 User account Mmnil2051 talk contribs was created automatically
- 16:35, 27 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Coaters/GammaDUV (Created page with "==Spin coater: Süss stepper== 300x300px|right|thumb|The SÜSS Spinner-Stepper is placed in F-3 This spinner is dedicated for spinning DUV resists. The spinner is fully automatic and can run up to 25 substrates in a batch 4", 6", and 8" size (8" requires tool change). The machine is equipped with the 3 resist lines (DUV42S-6, KRF M230Y, and KRF M35G), as well as a syringe dispense system. '''The user manual, quality control procedures and resul...")
- 16:21, 27 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Coaters/labspin (Created page with "== Manual Spin Coaters == {| cellpadding="2" style="border: 2px solid darkgray;" align="right" ! width="350" | ! width="350" | ! width="350" | |- border="0" align="center" |300px |300px |300px |- align="center" | '''Spin Coater: Labspin 02''' || '''Spin Coater: Labspin 03 + fumehood 11''' || '''Spin Coater: Manual All Purpose (Decommissioned)''' |- align="center" | Loacted in w...")
- 16:04, 27 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Coaters/RCD8 (Created page with "==Spin Coater: RCD8== 400px|thumb|Spin coater: RCD8 is located in C-1 Spin Coater: RCD8 is a model RCD8 T spin coater from Süss MicroTec with a motorized media arm and Gyrset functionality. It's primary purpose is spin coating of SU-8 resist. However, due to the possibility of using a non-vacuum chuck, the spin coater is also suitable for coating of substrates with e.g. textured backsides or membranes. '''The user manual, user APV, and c...")
- 15:57, 27 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Coaters/GammaEbeam (Created page with "==Spin Coater: Gamma E-beam and UV== 400px|right|thumb|Spin Coater: Gamma E-beam & UV in E-5 Spin Coater: Gamma E-beam and UV was installed at DTU Nanolab in June 2017. It is a Gamma 4M cluster from Süss MicroTec with spin coating, HMDS vapour priming, and baking modules. The system handles 2", 4", and 6" wafers without size conversion, using two separate coater stations. The 2" coater station is equipped with 1 resist line,...")
- 15:33, 27 January 2023 Kabi talk contribs created page File:Maskordering in Fusion.pdf
- 15:33, 27 January 2023 Kabi talk contribs uploaded File:Maskordering in Fusion.pdf
- 15:30, 27 January 2023 Kabi talk contribs created page File:Mask Ordering Guide.pdf
- 15:30, 27 January 2023 Kabi talk contribs uploaded File:Mask Ordering Guide.pdf
- 15:30, 27 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Coaters/GammaUV (Created page with "==Spin Coater: Gamma UV== 400px|right|thumb|Spin Coater: Gamma UV in E-5 '''Feedback to this section''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_UV click here]''' ''Coater comparison table'' Spin Coater: Gamma UV was insta...")
- 13:53, 27 January 2023 Bghe talk contribs created page File:Contour Plot etch rates SRN.jpg (File uploaded with MsUpload)
- 13:53, 27 January 2023 Bghe talk contribs uploaded File:Contour Plot etch rates SRN.jpg (File uploaded with MsUpload)
- 13:53, 27 January 2023 Bghe talk contribs created page File:Contour Plot etch rates SiO2.jpg (File uploaded with MsUpload)
- 13:53, 27 January 2023 Bghe talk contribs uploaded File:Contour Plot etch rates SiO2.jpg (File uploaded with MsUpload)
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