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LabAdviser/Technology Research/Fabrication of Hyperbolic Metamaterials using Atomic Layer Deposition/TiO2 Q plates: Difference between revisions

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|Spin-coating of CSAR resist to the thickness of 150 nm, followed by e-beam exposure.
|Spin-coating of CSAR resist to the thickness of 150 nm, followed by e-beam exposure.
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[[Specific_Process_Knowledge/Lithography/EBeamLithography/JEOL_JBX-9500FSZ|JEOL JBX-9500 Electron-beam]]  
[[Specific_Process_Knowledge/Lithography/EBeamLithography/JEOL_9500_User_Guide|JEOL JBX-9500 Electron-beam]]  
<br clear="all" />
<br clear="all" />
|[[image:Image2_ebeam_on_Si.jpg|250x350px|center]]
|[[image:Image2_ebeam_on_Si.jpg|250x350px|center]]
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