Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD: Difference between revisions
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|<1 | |<1 | ||
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|1PBSG | |||
|~228 nm/min | |||
|. | |||
|~17% | |||
|} | |} | ||
| Line 120: | Line 120: | ||
|<1 | |<1 | ||
|- | |- | ||
|1PBSG | |||
|~228 nm/min | |||
|. | |||
|~17% | |||
|} | |} | ||