LabAdviser/Technology Research/Fabrication of Hyperbolic Metamaterials using Atomic Layer Deposition/AZO pillars: Difference between revisions
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image:Fabrication_shematic_AZO_pillars_eves2.jpg|Figure 1. Schematics of the fabrication flow. a) Home-made SOI substrates. b) Deep-UV lithography. Resist spin coating, baking, exposure and developing. c) DRIE etching, fabrication of initial Si template. d) ALD deposition of D25 AZO at 250 °C. Partial deposition will lead to fabrication of tubes, while complete filling will create full pillars. e) Removal of the top AZO layer by Ar+ sputtering. f) Silicon host removal using conventional RIE process. | image:Fabrication_shematic_AZO_pillars_eves2.jpg|Figure 1. Schematics of the fabrication flow. a) Home-made SOI substrates. b) Deep-UV lithography. Resist spin coating, baking, exposure and developing. c) DRIE etching, fabrication of initial Si template. d) ALD deposition of D25 AZO at 250 °C. Partial deposition will lead to fabrication of tubes, while complete filling will create full pillars. e) Removal of the top AZO layer by Ar+ sputtering. f) Silicon host removal using conventional RIE process. | ||
image:AZO_structures_fab_supplementary_eves.jpg|Figure 2. SEM images, bird-eye-view. a) AZO pillars and b) AZO tubes. | image:AZO_structures_fab_supplementary_eves.jpg|Figure 2. SEM images, bird-eye-view. a) AZO pillars, and b) AZO tubes. | ||
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