Specific Process Knowledge/Thin film deposition/Deposition of Chromium/Thermal evaporation of Cr in Thermal evaporator: Difference between revisions
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* The deposition rate can be increased (up to 2Å/s or even 5 Å/s), but it requires a new recipe. | '''*''' The deposition rate can be increased (up to 2Å/s or even 5 Å/s), but it requires a new recipe. | ||
**Although it is possible to deposit 100 nm, we do not recommend exceeding the thickness setpoint above 80 nm, due to instabilities at the end. | '''**'''Although it is possible to deposit 100 nm, we do not recommend exceeding the thickness setpoint above 80 nm, due to instabilities at the end. | ||
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