Specific Process Knowledge/Thin film deposition/Deposition of Chromium/Thermal evaporation of Cr in Thermal evaporator: Difference between revisions
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== '''Recipe and process performance''' == | == '''Recipe and process performance''' == | ||
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!colspan="1" border="none" style="background:WhiteSmoke; color:black;" align="center"|Deposition rate (Å/s) | |||
|style="background:WhiteSmoke; color:black"|<b>1</b> | |||
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!style="background:WhiteSmoke; color:black;" align="center"|Maximum Thickness | |||
|style="background:WhiteSmoke; color:black" align="center"|100 nm | |||
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!style="background:WhiteSmoke; color:black" align="center"|Film Tooling | |||
|style="background:WhiteSmoke; color:black" align="center"|173 % | |||
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!style="background:WhiteSmoke; color:black" align="center"|Density | |||
|style="background:WhiteSmoke; color:black" align="center"|7.2 g/cm3 | |||
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!style="background:WhiteSmoke; color:black" align="center"|Z-factor | |||
|style="background:WhiteSmoke; color:black" align="center"|0.305 | |||
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=== '''Deposition of 100 nm''' === | === '''Deposition of 100 nm''' === | ||