LabAdviser/Technology Research/Fabrication of Hyperbolic Metamaterials using Atomic Layer Deposition/EMT Procces flow: Difference between revisions
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|TiO<sub>2</sub>/Al<sub>3</sub>O<sub>3</sub> multilayers deposition using Atomic Layer Deposition | |TiO<sub>2</sub>/Al<sub>3</sub>O<sub>3</sub> multilayers deposition using Atomic Layer Deposition | ||
|Deposition using recipies <b>EMA01</b>, <b>EMA02</b>, <b>EMA03</b> and <b>EMA04</b>. | |Deposition using recipies <b>EMA01</b>, <b>EMA02</b>, <b>EMA03</b> and <b>EMA04</b>. | ||
|[[Specific_Process_Knowledge/Thin_film_deposition/ALD_Picosun_R200|ALD Picosun R200]], | |[[Specific_Process_Knowledge/Thin_film_deposition/ALD_Picosun_R200|ALD Picosun R200]], <b>EMA01-04</b> Recipes description and performance: [[Specific_Process_Knowledge/Thin_film_deposition/ALD_Picosun_R200/ALD_multilayers#Low_temperature_grown_multilayers_on_flat_surfaces|Multilayrs recipes and their performance]] . | ||
|[[image:2 lithography mask 1.jpg|250x350px|center]] | |[[image:2 lithography mask 1.jpg|250x350px|center]] | ||
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