Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD: Difference between revisions
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'''68-69 nm/min''' (2015-04-24 BGHE)<br> | '''68-69 nm/min''' (2015-04-24 BGHE)<br> | ||
109 ± 2 nm/min [tested: 2014-03-18] | 109 ± 2 nm/min [tested: 2014-03-18] ''Old shower head'' | ||
|- | |- | ||
!index of refraction | !index of refraction | ||
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'''1.463-1.464''' (2015-04-24 BGHE)<br> | '''1.463-1.464''' (2015-04-24 BGHE)<br> | ||
1.465 [tested: 2014-03-18] | 1.465 [tested: 2014-03-18] ''Old shower head'' | ||
|- | |- | ||
!Uniformity | !Uniformity | ||
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'''1%''' over the wafer (2015-04-24 BGHE)<br> | '''1%''' over the wafer (2015-04-24 BGHE)<br> | ||
3.2% over the wafer [tested: 2014-03-18] | 3.2% over the wafer [tested: 2014-03-18] ''Old shower head'' | ||
|} | |} | ||