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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,317 edits
Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,317 edits
Line 121: Line 121:
!index of refraction
!index of refraction
|1.47
|1.47
|1.465 [tested: 2014-03-18]
|
1.463-1.464 (2015-04-24 BGHE)<br>
1.465 [tested: 2014-03-18]
|-
|-
!Uniformity
!Uniformity
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