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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD: Difference between revisions

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|N<math>_2</math>O flow [sccm]
|N<math>_2</math>O flow [sccm]
|N2 flow [sccm]
|N2 flow [sccm]
|B2H6 flow [sccm]
|PH3 flow [sccm]
|Pressure [mTorr]
|Pressure [mTorr]
|Power [W]
|Power [W]
|Description
|Description
|-  
|-  
|1oxide
|1oxide/standard
|17
|17
|1600
|1600
|0
|0
|0
|0
|400
|400
|380LF
|380LF
|Developed for waveguides
|Developed for waveguides
|-
|1PBSG
|
|
|
|
|
|
|
|Developed for waveguide top cladding
|-
|-
|}
|}
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