Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD: Difference between revisions
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|RI | |RI | ||
|Uniformity [%] | |Uniformity [%] | ||
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|LFSiO | |LFSiO | ||
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|~1.48 | |~1.48 | ||
|<1 | |<1 | ||
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