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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD: Difference between revisions

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|RI
|RI
|Uniformity [%]
|Uniformity [%]
|
|-  
|-  
|LFSiO
|LFSiO
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|~1.48
|~1.48
|<1
|<1
|
|-
|-
|}
|}