Specific Process Knowledge/Thin film deposition/Deposition of Chromium/Thermal evaporation of Cr in Thermal evaporator: Difference between revisions

Revision as of 14:45, 29 May 2021 view source Eves (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 4,346 edits →Deposition of 100 nm ← Older edit		Revision as of 14:47, 29 May 2021 view source Eves (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 4,346 edits →X-ray reflectivity method Newer edit →
Line 219:		Line 219:
	===X-ray reflectivity method===		===X-ray reflectivity method===

	XRR measurements for Cr film has been performed using Rigaku XRD SmartLab diffractometer.		XRR measurements for Cr film has been performed using [[Specific_Process_Knowledge/Characterization/XRD/XRD_SmartLab\|Rigaku XRD SmartLab diffractometer]].