Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD: Difference between revisions
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|Uniformity [%] | |Uniformity [%] | ||
|Stress | |Stress | ||
|Comment | |||
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|LFSiO2 | |LFSiO2 | ||
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|~1.5% | |~1.5% | ||
|'''400-402 MPa''' compressive stress '' by Anders Simonsen @nbi.ku.dk April 2016'' | |'''400-402 MPa''' compressive stress '' by Anders Simonsen @nbi.ku.dk April 2016'' | ||
|We have seen that this recipe does not deposit the first minute | |||
|- | |- | ||
|LFSiO | |LFSiO | ||
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|<1 | |<1 | ||
|not measured | |not measured | ||
|. | |||
|- | |- | ||
|1PBSG | |1PBSG | ||
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|~17% | |~17% | ||
|not measured | |not measured | ||
|. | |||
|} | |} | ||
<br clear="all" /> | <br clear="all" /> | ||
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|Description | |Description | ||
|- | |- | ||
|Core-Ge | |Core-Ge (not possible anymore as we have no Germanium) | ||
|17 | |17 | ||
|1600 | |1600 | ||
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|~1.458 | |~1.458 | ||
|} | |} | ||
=Recipes on PECVD2 for deposition of silicon oxides <span style="color:Red">EXPIRED!!!</span>= | =Recipes on PECVD2 for deposition of silicon oxides <span style="color:Red">EXPIRED!!!</span>= | ||