Jump to content

LabAdviser/Technology Research/Fabrication of Hyperbolic Metamaterials using Atomic Layer Deposition/TiO2 Q plates: Difference between revisions

← Older edit
VisualWikitext
Eves (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,346 edits
No edit summary
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,178 edits
 
(One intermediate revision by one other user not shown)
Line 2: Line 2:


<i>This page is written by <b>Evgeniy Shkondin @DTU Nanolab</b> if nothing else is stated. <br>
<i>This page is written by <b>Evgeniy Shkondin @DTU Nanolab</b> if nothing else is stated. <br>
All images and photos on this page belonges to <b>DTU Nanolab</b> and <b>DTU Electro</b> (previous DTU Fotonik).<br>
All images and photos on this page belongs to <b>DTU Nanolab</b> and <b>DTU Electro</b> (previous DTU Fotonik).<br>
The fabrication and characterization described below were conducted in <b>2013-2016 by Evgeniy Shkondin, DTU Nanolab</b>.<br></i>
The fabrication and characterization described below were conducted in <b>2013-2016 by Evgeniy Shkondin, DTU Nanolab</b>.<br></i>


Line 77: Line 77:
|Spin-coating of CSAR resist to the thickness of 150 nm, followed by e-beam exposure.
|Spin-coating of CSAR resist to the thickness of 150 nm, followed by e-beam exposure.
|
|
[[Specific_Process_Knowledge/Lithography/EBeamLithography/JEOL_JBX-9500FSZ|JEOL JBX-9500 Electron-beam]]  
[[Specific_Process_Knowledge/Lithography/EBeamLithography/JEOL_9500_User_Guide|JEOL JBX-9500 Electron-beam]]  
<br clear="all" />
<br clear="all" />
|[[image:Image2_ebeam_on_Si.jpg|250x350px|center]]
|[[image:Image2_ebeam_on_Si.jpg|250x350px|center]]
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=LabAdviser/Technology_Research/Fabrication_of_Hyperbolic_Metamaterials_using_Atomic_Layer_Deposition/TiO2_Q_plates"