Specific Process Knowledge/Characterization/AFM: Atomic Force Microscopy/AFM Icon Acceptance: Difference between revisions
| Line 274: | Line 274: | ||
*0dg | *0dg | ||
*Step height: 1545/1532 nm | *Step height: 1545/1532 nm | ||
[[File:SiO2-resist step Tapping mode with TAP150A.JPG|400px]] | |||
====ScanAsyst with TAP150A==== | ====ScanAsyst with TAP150A==== | ||
*CL on | *CL on | ||
| Line 283: | Line 283: | ||
*Peak force frequency: 2 Hz | *Peak force frequency: 2 Hz | ||
*Step height: 1537 nm | *Step height: 1537 nm | ||
[[File:SiO2-resist step ScanAsyst mode with TAP150A.JPG|400px]] | |||
====ScanAsyst with ScanAsyst-air==== | ====ScanAsyst with ScanAsyst-air==== | ||
*CL on | *CL on | ||
| Line 291: | Line 292: | ||
*Peak force frequency: 2 Hz | *Peak force frequency: 2 Hz | ||
*Step height: 1545 nm | *Step height: 1545 nm | ||
[[File:SiO2-resist step ScanAsyst mode with ScanAsyst-air.JPG|400px]] | |||
====Tapping mode with RFESP-75==== | ====Tapping mode with RFESP-75==== | ||
*CL on | *CL on | ||
| Line 296: | Line 298: | ||
*0dg | *0dg | ||
*Step height: 1525 nm | *Step height: 1525 nm | ||
[[File:SiO2-resist step Tapping mode with RFESP-75.JPG|400px]] | |||