Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD/HF SiO2 results

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A test made using Standard HFSiO2 15 min on PECVD4 2020-08-14 Berit Herstrøm @DTU Nanolab

The result wafer (4") was measured with the ellipsometer. See the results here: Media:PECVD4 HfSiO2 15min.docx

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