Specific Process Knowledge: Difference between revisions
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2nd Level - Process Topic
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|rowspan="7" valign="top"|[[Specific Process Knowledge/Thin film deposition| Thin film deposition]] | |rowspan="7" valign="top"|[[Specific Process Knowledge/Thin film deposition| Thin film deposition]] | ||
|Sputter deposition | |Sputter deposition | ||
|Metals: Ti, | |Metals: Al, Ti, Cr, Co, Ni, Cu, Mo, Pd, Ag, Sn, Ta, W, Pt, Au, Fe, Mg, Nb, Ru <br> | ||
Semiconductors: Si, Ge <br> | Semiconductors: Si, Ge, ZnO <br> | ||
Oxides: SiO2, ITO, | Oxides: SiO2, ITO, TiO2, Al2O3, MgO, Ta2O3 Cr2O3<br> | ||
Alloys: | Transparent Conducting Oxides: ITO, AZO<br> | ||
Alloys: TiW, NiCr, AlTi, NiV, AlCu, CoFe, CuTi, FeMn, MnIr, NiCo, NiFe, YSZ <br> | |||
|- | |- | ||
|Thermal evaporation | |Thermal evaporation | ||
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|Metals: Ti, Cr, Al, Ni, Pt, Au, Mo, Pd, Ag, Cu, W, Ta <br> | |Metals: Ti, Cr, Al, Ni, Pt, Au, Mo, Pd, Ag, Cu, W, Ta <br> | ||
Semiconductors: Si, Ge <br> | Semiconductors: Si, Ge <br> | ||
Oxides: SiO2, | Oxides: SiO2, TiO2 <br> | ||
Alloys: NiCr, TiAl | Alloys: NiCr, TiAl | ||
|- | |- |
Revision as of 17:22, 17 November 2014
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