Specific Process Knowledge/Thin film deposition/MVD

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Thin film MVD MVD

The Molecular Vapor Deposition tool

The Applied Microstructures MVD 100 system deposits molecular films on surfaces. These films serve a wide range of purposes ranging from antistiction coatings of nanoimprint lithography stamps to protecting MEMS structures. At DTU Nanolab the MVD is an essential tool for nanoimprint lithography, where it is used to create antistiction coatings on the imprint stamps.

As per Jan 2025 the O2 plasma is no longer possible to use, we recommend to use a plasma asher before use and then run Flat2NP and Stamp2NP respectively, where NP is for No Plasma. - rkc

The user manual, user APV, and contact information can be found in LabManager:

MVD in LabManager

Process information

Equipment performance and process related parameters

Purpose		FDTS coating of Si or SiO2 surfaces Indirect O2 plasma treatment
Vapor sources	Line 1 2 3 4	Chemical Water FDTS (new source, 2013) FDTS (old source, contaminated line) Available (line probably contaminated, no source heater)
Performance	Contact angle	110° (water)
Process parameters	Base pressure	20 mTorr
	Chamber temperature	35°C
	Chamber volume	Approx. 3 liters
Substrates	Substrate size	1" to 8" Smaller samples may be processed if fixed to a carrier
	Allowed materials	All cleanroom materials except steel and other ferrous materials
	Batch	One sample at a time Two 4" or 6" wafers may be processed simultaneously using cassettes