Specific Process Knowledge/Thin film deposition/Deposition of Palladium

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Palladium can be deposited by e-beam evaporation or DC sputtering at DTU Nanolab.

Sputtering of Palladium

Palladium may be sputter deposited in the sputter-system (Lesker). See process results here:

In the chart below you can compare the different deposition equipment:

	E-beam evaporation (Temescal and E-beam evaporator (10-pockets))	Sputter deposition (Sputter-System (Lesker))	Sputter deposition (Sputter-system Metal-Oxide (PC1) and Sputter-system Metal-Nitride (PC3))
General description	E-beam deposition of Pd	Sputter deposition of Pd	Sputter deposition of Pd
Pre-clean	Ar ion source (only in E-beam Evaporator Temescal)	none	RF Ar clean
Layer thickness	10 Å - 600 nm*	10 Å - 600 nm*	Discuss with staff
Deposition rate	0.5 Å/s to 10Å/s	Up to 4.3 Å/s	Discuss with staff
Batch size	Up to 4x6" wafers Up to 3x8" wafers smaller wafers and pieces	1x4" wafer or 1x6" wafer or several small samples	Up to 10x4" or 6" wafers Many smaller pieces
Allowed materials	Almost any that does not degas See also the cross-contamination sheet	Almost any that does not degas. See also the cross-contamination sheet	Almost any that does not degas at your intended substrate temperature. See cross contamination sheets for PC1 and PC3
Comment

* If depositing more than 600 nm, please write to metal@nanolab.dtu.dk well in advance to ensure that enough material is present.