Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ALD multilayers

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This page is written by DTU Nanolab internal

This page describes non-standart recipes including multilayers structures. They were the first test recipes on the ALD-1 to test the tool functionality and can be used as inspiration.

Low temperature deposition of Al₂O₃

Recipe: Al2O3 LT

Temperature: 80-150 ^oC

	TMA	H₂O
Nitrogen flow	150 sccm	200 sccm
Pulse time	0.1 s	0.2 s
Purge time	5.0 s	10.0 s

Deposition rate: 0.089 nm/cycle (@120 ^oC)

This recipe has been developd for fabrication of high quality homogenious optical layers at low temperature. Research related results with this recipe can be found here: LINK - requires login (Phys. Rev. Lett. 115(17) 2015, 177402)

Al₂O₃ deposition at 120 ^oC

Deposition conditions at 120 ^oC for Al2O3 LT recipe
Number of cycles	Thickness (nm)	Uniformity across 100mm Si substrate (%)	Standard deviation error	Refractive index @ 632.8 nm
250	24.83	1.22	0.16	1.61
500	45.48	1.35	0.41	1.63
750	68.03	1.42	0.59	1.63
1000	90.66	1.74	0.94	1.63

The uniformity, thickness, refractive index has been obtained using Ellipsometer VASE.

Measured thickness distribution across 100 mm wafer.
Measured refractive index distribution across 100 mm wafer.

Evgeniy Shkondin, DTU Nanolab, 2014-2016.

Low temperature deposition of TiO₂

Recipe: TiO2 LT

Temperature: 80-150 ^oC

	TiCl₄	H₂O
Nitrogen flow	150 sccm	200 sccm
Pulse time	0.2 s	0.2 s
Purge time	10.0 s	15.0 s

Deposition rate: 0.048 nm/cycle (@ 120 ^oC)

This recipe has been developd for fabrication of high quality homogenious optical layers at low temperature. The deposited TiO₂ layers are amorphous. Research related results with this recipe can be found here: LINK - requires longin (Phys. Rev. Lett. 115(17) 2015, 177402)

TiO₂ deposition at 120 ^oC

Deposition conditions at 120 ^oC for TiO2 LT recipe
Number of cycles	Thickness (nm)	Uniformity across 100mm Si substrate (%)	Standard deviation error	Refractive index @ 632.8 nm
250	10.17	2.19	0.14	2.18
500	23.12	1.80	0.23	2.40
750	34.13	1.87	0.39	2.39
1000	46.13	1.78	0.50	2.39

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The uniformity, thickness, refractive index has been obtained using Ellipsometer VASE.

Measured thickness distribution across 100 mm wafer.
Measured refractive index distribution across 100 mm wafer.

Evgeniy Shkondin, DTU Nanolab, 2014-2016.

Low temperature grown multilayers on flat surfaces

Recipe: EMA01

Recipe: EMA02

Recipe: EMA03

Recipe: EMA04

Temperature: 120 ^oC

All four recipes is based on Al2O3_LT amd TiO2_LT above mentioned low temperature recipes. Optical research based on fabricated Al₂O₃ and TiO₂ multilayers has been published LINK (Phys. Rev. Lett. 115(17) 2015, 177402)