Specific Process Knowledge/Lithography/UVlithographyProcessPages

Pre-lithography Getting started with UV lithography Getting started Resist User bottles in the cleanroom UV Resist DUV Resist E-beam Resist Imprint Resist Substrate Pre-treatment HMDS BHF Oven 250C

Coating Automatic spin coating Spin Coater: Gamma UV Spin Coater: Süss Stepper Spin Coater: Gamma e-beam & UV Manual spin coating Spin Coater: RCD8 Spin Coater: Labspin 02/03 Spray coating Spray Coater Soft & hard baking Hotplates Ovens

Exposure/design transfer UV Exposure Tools Aligner: MA6-1 Aligner: MA6-2 Aligner: Maskless 01 Aligner: Maskless 02 Aligner: Maskless 03 Aligner: Maskless 04 Deep-UV Exposure DUV Stepper (Canon FPA-3000EX4) Electron Beam Exposure JEOL 9500 Raith Eline Nano Imprint Lithography Molecular Vapour Deposition Imprinter 01

Development Manual development Manual beaker development SU-8 development Developer: SU8 (Wetbench) Semi-automatic puddle development Developer: E-beam 02 Developer: TMAH Manual 02 Automatic puddle development Developer: TMAH UV-lithography Developer: TMAH Stepper

Post-lithography Descum Plasma Asher 3: Descum Plasma Asher 4 Plasma Asher 5 BHF Lift-off Lift-off Strip Plasma Asher 3: Descum Plasma Asher 4 Plasma Asher 5 Resist Strip