Specific Process Knowledge/Lithography/EBeamLithography/ma-N 2400

Spin coating

ma-N 2400 can be spin coated on LabSpin 2 and 3 using the CSAR/PMMA bowlset. A spin curve for ma-N 2400.05 is provided below. Process parameters are:

• Date: May 31st 2024
• Coater: LabSpin 2
• Substrate: 2" Si
• Acceleration: 1000 RPM/s
• Time: 60 s
• Baking temperature: 90C (setpoint at 100C)
• Baking time: 60 s

ma-N 2400.05 spin curve.

Resulting resist thickness can be determined as y = ax^b+c, where y is thickness [nm], x is spin speed [RPM], a = 1015400, b = -1.1 and c = 368.3.