Specific Process Knowledge/Etch/Overview of chemicals
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All measurements on this page has been made by Nanolab staff.
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Descreption: On this page you can have an overveiw of the standardt Chimicals we have in the Cleenroom, as well as link to Kemibrug for those chemicals. you will also be able to see if there is any change in the chemicals we have or something else about them in the commets.
| Chemical | Cas Nr. | Concentration | Grade | Comment |
|---|---|---|---|---|
| Acetone | Cas Nr. 67-64-1 | 99,8%-100% | VLSi | |
| Ammoniumhydroxyd | Cas Nr. 1336-21-6 | 28% | VLSI | Comment |
| Ammoniumperoxodisulfat | Cas Nr. 7727-54-0 | 98%-99,1% | Analyse | Comment |
| Anisole Anhydrous | Cas Nr. 100-66-3 | 99,7% | GPR | Comment |
| AR-600-546 Developer | Cas Nr. no nr. | not specified | not specified | Comment |
| AR-600-71 Remover | Cas Nr. no nr. | not specific | not specific | Comment |
| AR-6200.09 E-beam resist | Cas Nr. no nr. | not specific | not specific | Comment |
| AZ 351B Developer | Cas Nr. no nr. | not specific | not specific | Comment |
| AZ 4562 Photoresist | Cas Nr. no nr. | not specific | not specific | Comment |
| AZ 5214E Photoresist | Cas Nr. no nr. | not specific | not specific | Comment |
| AZ 726MIF developer | Cas Nr. no nr. | not specific | not specific | Comment |
| AZ 726MIF developer (Tromle) | Cas Nr. no nr. | not specific | not specific | Comment |
| AZ MiR 701 (29CPS) Photoresist | Cas Nr. No nr. | not specific | not specific | Comment |
| AZ nLOF 2020 Photoresist | Cas Nr. no nr. | not specific | not specific | Comment |
| Boric Acid powder | Cas Nr. 10043-35-3 | not specific | Analytic | Comment |
| Chrome etch 18 | Cas Nr. no nr. | not specific | not specific | Comment |
| Developer MIBK Methylisobutylketon 4L | Cas Nr. 108-10-1 | not specific | VLSI | Comment |
| DUV42S-6,4 L ultra nowpak W/Closure lid | Cas Nr. no nr. | not specific | Aicello | Comment |
| Ethanol | Cas Nr. 64-17-5 | 99,9%-100% | VLSI | Comment |
| Hydrofluoric acid buffer (BHF/BOE) | Cas Nr. no nr. | 12,5% | not specific | Comment |
| Hydrofluoric acid buffer (BHF/BOE W/wetting agent) | Cas Nr. no nr. | 12,5% | not specific | Comment |
| Hexamethyldisilasan | Cas Nr. 999-97-3 | not specific | not specific | Comment |
| HYDROFLUORIC ACID (HF) | Cas Nr. no nr. | 1% | VLSI | Comment |
| Cas Nr. No nr. | 10% | VLSI | Will be removed ones we no longer have any in storage | |
| Cas Nr. no nr. | 40% | EMSURE® ISO for analysis | Comment | |
| Cas Nr. no nr. | 50% | VLSI | Comment | |
| Hydrochloric acid | Cas Nr. 7647-01-0 | 37% | VLSI | Comment |
| Hydrogenperoxid | Cas Nr. 7722-84-1 | 31% | VLSI | Comment |
| KRF m230Y 6cP Gal | Cas Nr. no nr. | not specific | not specific | Comment |
| KRF M35G 27cP Gal | Cas Nr. no nr. | not specific | not specific | Comment |
| Microposit Remover 1165 | Cas Nr. no nr. | not specific | Grade | Comment |
| Nitric acid | Cas Nr. 231-714-2 | 69% | VLSI | Comment |
| Ortho-Phosphoric acid | Cas Nr. 7664-38-2 | 85% | VLSI | Comment |
| Potassium hydroxide solution | Cas Nr. 1310-58-3 | not specific | Selectipur | Comment |
| Isoropanol | Cas Nr. 67-63-0 | not specific | VLSi | Comment |
| SU-8 2005 | Cas Nr. no .nr | not specific | not specific | Comment |
| SU-8 2035 | Cas Nr. no .nr | not specific | not specific | Comment |
| SU-8 2075 | Cas Nr. no .nr | not specific | not specific | Comment |
| SU-8 Developer (Mr-dev 600) | Cas Nr. no nr. | not specific | not specific | Comment |
| SU-8 Thinner | Cas Nr. no nr. | not specific | not specific | Comment |
| Sulfamic acid | Cas Nr. 5329-14-6 | not specific | Alkamlimetry | Comment |
| Sulfuric acid | Cas Nr. 7664-93-9 | 95%-97% | VLSI | Comment |
| TI spray | Cas Nr. no nr. | not specific | not specific | Comment |
| ZED N50 | Cas Nr. no nr. | not specific | not specific | Comment |
| Triton x-100 | Cas Nr. 9002-93-1 | not specific | not specific | Comment |