Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide/By Peixiong/images CF4

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All images on this page has been created by Peixiong Shi, DTU Nanolab

Images stepper_6A1_feb262013_step9

  • 6A1_feb262013_step9
  • 8mm from wafer edge 074.jpg
  • Wfcent1 073.jpg
  • Wfcent1 075.jpg
  • Wfcent1 076.jpg

Images stepper_6A4_feb262013_step9

  • 6A4_feb262013_step9

  • wafer edge

  • wafer edge

  • wafer edge

  • wafer edge

  • Position of the scanning: wafer edge

  • wafer edge

  • wafer edge

  • 20mm from wafer edge 098.jpg
  • 20mm from wafer edge 099.jpg

  • wafer center

  • wafer center

  • wafer center

  • wafer center

Images Stepper_6A5_feb272013

  • 6A5_feb262013 step9 and step10

  • Wafer edge

  • Wafer edge

  • Wafer edge

  • Wafer edge

  • Wafer edge

  • Wafer edge

  • Wafer center

  • Wafer center

  • Wafer center

  • Wafer center

  • Wafer center

  • Top view

  • Top view

  • Top view

  • Top view

  • Top view

  • Top view

images 3

  • 6A1_feb262013_step9
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