Specific Process Knowledge/Etch/DRIE-Pegasus/nanobosch/nanobosch6

Test run using AZ resist 24/9-2012

**Process conditions**
Substrate information	Wafer	C01296.05
	Mask	Travka50 mask in a few microns of AZ resist
	Date	24/9-2012
	Tool	Pegasus
Process	Recipe	nanobosch6
	Tool conditioning	3 minute TDESC clean
	Process duration	15 minutes
	Purpose	test
	Characterisation	SEM Zeiss

**Process conditions**
Substrate information	Wafer	C01296.09
	Mask	Travka80 mask in a few microns of AZ resist
	Date	24/9-2012
	Tool	Pegasus
Process	Recipe	nanobosch6
	Tool conditioning	3 minute TDESC clean
	Process duration	15 minutes
	Purpose	test
	Characterisation	SEM Zeiss