| 29/11-2019
|
Medusa One
|
Si / 10%
|
stab-19 chamber clean 20
|
nanolab/ jmli /DREM 3.0 kW 100% a
|
S018652
|
Process log entry
|
|
|
| SEM image:
|
a000
|
a001
|
a002
|
a003
|
a004
|
a005
|
a006
|
a007
|
a008
|
a009
|
| Trench width (um) |
400.14 |
400.65 |
249.77 |
161.15 |
81.37 |
41.79 |
20.28 |
9.84 |
4.27 |
2.71
|
| Etched depth (um) |
140.42 |
140.43 |
141.5 |
141.57 |
135.57 |
124.71 |
108.95 |
91.98 |
70.41 |
60.74
|
| Etch rate (um/min) |
14.04 |
14.04 |
14.15 |
14.16 |
13.56 |
12.47 |
10.89 |
9.2 |
7.04 |
6.07
|
| Etch rate (nm/cyc) |
1.17 |
1.17 |
1.18 |
1.18 |
1.13 |
1.04 |
0.91 |
0.77 |
0.59 |
0.51
|
| Sidewall bowing (%) |
-0.36 |
-0.8 |
-0.45 |
-0.31 |
-0.14 |
-0.04 |
0.28 |
0.64 |
0.44 |
0.76
|
| Sidewall angle (degs) |
93.28 |
93.18 |
93.1 |
92.33 |
91.82 |
91.58 |
91.53 |
91.37 |
91.12 |
90.66
|
| Bottom bowing (%) |
3.39 |
3.99 |
5.43 |
8.68 |
13.13 |
16.86 |
18.26 |
13.09 |
16.07 |
18.41
|
| Aspect ratio |
0.34 |
0.34 |
0.55 |
0.85 |
1.58 |
2.76 |
4.7 |
7.64 |
12.46 |
17.77
|
|
