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Track the most recent changes to the wiki on this page.
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- m
- This is a minor edit
- b
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16 May 2024
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14:24 | Specific Process Knowledge/Thin film deposition/Temescal 2 changes history −1 [Bghe (2×)] | |||
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14:24 (cur | prev) −1 Bghe talk contribs (→Materials for e-beam evaporation) | ||||
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14:22 (cur | prev) 0 Bghe talk contribs (→Materials for e-beam evaporation) | ||||
14 May 2024
| 13:48 | Specific Process Knowledge/Etch/Aluminum Oxide/Al2O3 Etch with ICP Metal diffhist −14 Bghe talk contribs (→Al2O3 etching with the ICP metal) | ||||
13 May 2024
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17:24 | Specific Process Knowledge/Characterization/XRD/XRD Powder/Measurement tips 9 changes history +743 [Reet (9×)] | |||
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17:24 (cur | prev) +57 Reet talk contribs (→Choosing measurement parameters) | ||||
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17:23 (cur | prev) −5 Reet talk contribs (→Choosing measurement parameters) | ||||
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17:22 (cur | prev) −198 Reet talk contribs (→Choosing measurement parameters) | ||||
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17:19 (cur | prev) +64 Reet talk contribs (→Fluorescence suppression) | ||||
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17:19 (cur | prev) +104 Reet talk contribs (→Fluorescence suppression) | ||||
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17:18 (cur | prev) −1 Reet talk contribs (→Choosing measurement parameters) | ||||
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17:16 (cur | prev) −75 Reet talk contribs | ||||
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17:15 (cur | prev) +1 Reet talk contribs (→Fluorescence suppression) | ||||
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17:15 (cur | prev) +796 Reet talk contribs (→Choosing measurement parameters) | ||||
| 17:14 | Upload log Reet talk contribs uploaded File:Fluoresc supp feoh.png (File uploaded with MsUpload) | ||||
| 16:59 | Specific Process Knowledge/Characterization/XRD/XRD Powder diffhist +304 Reet talk contribs (→The XRD Powder setup) | ||||
| 16:56 | Specific Process Knowledge/Characterization/XRD/XRD Powder/XRD Powder software diffhist −145 Reet talk contribs (→Software for the XRD Powder) | ||||
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14:43 | LabAdviser 3 changes history −106 [Mmat; Bghe (2×)] | |||
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14:43 (cur | prev) +11 Bghe talk contribs | ||||
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14:35 (cur | prev) +12 Bghe talk contribs | ||||
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09:54 (cur | prev) −129 Mmat talk contribs | |||
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m 09:42 | LabAdviser/Process flow approval 4 changes history +146 [Mmat (4×)] | |||
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09:42 (cur | prev) +18 Mmat talk contribs (→Recommendations to the setup of the process flow) | |||
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09:38 (cur | prev) +38 Mmat talk contribs (→Why do process flows need to be reviewed) | |||
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09:36 (cur | prev) +48 Mmat talk contribs (→Why do process flows need to be reviewed) | |||
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09:31 (cur | prev) +42 Mmat talk contribs (→Why do process flows need to be reviewed) | |||
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09:30 | Template:DanchipInfo 4 changes history +56 [Mmat (4×)] | |||
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09:30 (cur | prev) +14 Mmat talk contribs | |||
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09:29 (cur | prev) −77 Mmat talk contribs | ||||
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09:28 (cur | prev) −1 Mmat talk contribs | ||||
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09:27 (cur | prev) +120 Mmat talk contribs | ||||
8 May 2024
| 16:30 | LabAdviser diffhist +13 Bghe talk contribs (→Contact Information for the DTU Nanolab fabrication part) | ||||
| 15:30 | Template:DanchipInfo diffhist −1,059 Mmat talk contribs | ||||
| m 11:43 | LabAdviser/Process flow approval diffhist +4 Mmat talk contribs (→Why do process flows need to be reviewed) | ||||
7 May 2024
| 10:24 | LabAdviser/314/Microscopy 314-307/TEM/ETEM diffhist +65 Jenk talk contribs (→Process information) | ||||
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10:22 | LabAdviser/314/Microscopy 314-307/Technique/Holo/Off-axis ETEM 7 changes history +10,849 [Jenk (7×)] | |||
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10:22 (cur | prev) +3 Jenk talk contribs (→Notes/Tips) | ||||
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10:17 (cur | prev) −6 Jenk talk contribs | ||||
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10:15 (cur | prev) −5 Jenk talk contribs (→Electron Holography on the ETEM) | ||||
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10:14 (cur | prev) −30 Jenk talk contribs (→Procedure for Performing Electron Holography in ETEM) | ||||
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09:52 (cur | prev) +647 Jenk talk contribs (→Procedure for Performing Electron Holography in ETEM) | ||||
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09:10 (cur | prev) +3,957 Jenk talk contribs (→Procedure for Performing Electron Holography in ETEM) | ||||
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09:02 (cur | prev) +6,283 Jenk talk contribs (→Procedure for Performing Electron Holography in ETEM) | ||||
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10:20 | LabAdviser/314/Microscopy 314-307/Technique/Holo 2 changes history +109 [Jenk (2×)] | |||
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10:20 (cur | prev) +11 Jenk talk contribs (→relevant microscopes) | ||||
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10:20 (cur | prev) +98 Jenk talk contribs (→relevant microscopes) | ||||
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10:18 | (Upload log) [Jenk (6×)] | |||
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10:18 Jenk talk contribs uploaded File:Holo-power-supply ETEM.jpg | ||||
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10:18 Jenk talk contribs uploaded File:Holo-control-box-setting ETEM.png | ||||
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10:18 Jenk talk contribs uploaded File:Holo-control-box ETEM.jpg | ||||
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10:18 Jenk talk contribs uploaded File:Holo-cable ETEM.jpg | ||||
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10:18 Jenk talk contribs uploaded File:Holo-beam-alignment.png | ||||
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10:18 Jenk talk contribs uploaded File:Holo-artefact-frindges.jpg | ||||
6 May 2024
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N 17:41 | LabAdviser/314/Microscopy 314-307/Technique/Holo/Off-axis ETEM 4 changes history +5,687 [Jenk (4×)] | |||
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17:41 (cur | prev) +111 Jenk talk contribs | ||||
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17:40 (cur | prev) +75 Jenk talk contribs (→Setting up the ETEM for Holography) | ||||
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17:35 (cur | prev) +5,155 Jenk talk contribs | ||||
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17:24 (cur | prev) +346 Jenk talk contribs (Created page with "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/LabAdviser/314/Microscopy_314-307/Technique/Holo/Off-axis_ETEM click here]''' (''content by Mads Søndergaard Larsen @DTU Nanolab, May 2024'') __FORCETOC__ Category:314 Category:314-Microscopy") | |||
| 17:29 | Upload log Jenk talk contribs uploaded File:Schematic holo.jpg | ||||
| 17:22 | LabAdviser/314/Microscopy 314-307/Technique/Holo diffhist +100 Jenk talk contribs (→more detailed information) | ||||
| 10:41 | LabAdviser/314/Preparation 314-307/Coating diffhist −1 Jenk talk contribs (→Quorum Q150T Sputter Coater and Glow discharge) | ||||
3 May 2024
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16:16 | LabAdviser 3 changes history +8 [Bghe (3×)] | |||
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16:16 (cur | prev) 0 Bghe talk contribs | ||||
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16:15 (cur | prev) +1 Bghe talk contribs | ||||
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16:14 (cur | prev) +7 Bghe talk contribs | ||||
| 16:13 | Upload log Bghe talk contribs uploaded File:Til LA forside 2024-05-03 161145.png (File uploaded with MsUpload) | ||||
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15:50 | Template:DanchipInfo 2 changes history +21 [Bghe (2×)] | |||
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15:50 (cur | prev) +2 Bghe talk contribs | ||||
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15:49 (cur | prev) +19 Bghe talk contribs | ||||
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14:44 | Specific Process Knowledge/Lithography/EBeamLithography/EBLsubstratePrep 4 changes history +300 [Thope (4×)] | |||
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14:44 (cur | prev) +1 Thope talk contribs (→DTU Nanolab supplied EBL resists) | ||||
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14:29 (cur | prev) +10 Thope talk contribs (→DTU Nanolab supplied EBL resists) | ||||
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14:29 (cur | prev) −4 Thope talk contribs (→DTU Nanolab supplied EBL resists) | ||||
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14:28 (cur | prev) +293 Thope talk contribs (→DTU Nanolab supplied EBL resists) | ||||
30 April 2024
| 10:57 | Specific Process Knowledge/Thin film deposition/ALD Picosun R200 diffhist +19 Pevo talk contribs (→Equipment performance and process related parameters) | ||||
29 April 2024
| 12:37 | Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using ASE/tests CHF3+H2 diffhist −972 Mfarin talk contribs (→Etch test of Silicon Nitride) | ||||
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11:54 | Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using ASE/More test with CF4/H2, CHF3 and C4F8/H2 - SiO2 etch 2 changes history +1,577 [Mfarin (2×)] | |||
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11:54 (cur | prev) −6 Mfarin talk contribs (→More test with CF4/H2 - SiO2 etch) | ||||
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11:53 (cur | prev) +1,583 Mfarin talk contribs | ||||
25 April 2024
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07:31 | Specific Process Knowledge/Lithography/EBeamLithography/AR-P 617 2 changes history +20 [Thope (2×)] | |||
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07:31 (cur | prev) +17 Thope talk contribs (→Contrast curve) | ||||
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07:30 (cur | prev) +3 Thope talk contribs (→Contrast curve) | ||||
23 April 2024
| 10:50 | Specific Process Knowledge/Wafer and sample drying diffhist +11 Mbec talk contribs (→Ethanol fume dryer) | ||||
22 April 2024
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15:24 | Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using ASE 3 changes history −22 [Mfarin (3×)] | |||
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15:24 (cur | prev) +7 Mfarin talk contribs (→C4F8/H2 chemistry - SiO2 etch) | ||||
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15:03 (cur | prev) −27 Mfarin talk contribs | ||||
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15:02 (cur | prev) −2 Mfarin talk contribs (→CF4/H2 chemistry - SiO2 etch) | ||||
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15:01 | Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using ASE/tests CHF3+H2 11 changes history +533 [Mfarin (11×)] | |||
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15:01 (cur | prev) +2 Mfarin talk contribs (→SiO2 test - 5 jan 2024) | ||||
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15:00 (cur | prev) +34 Mfarin talk contribs (→2SiO2 test - 5 jan 2024) | ||||
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14:57 (cur | prev) −20 Mfarin talk contribs (→Etch test of Silicon Nitride) | ||||
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14:57 (cur | prev) +27 Mfarin talk contribs (→Etch test of Silicon Nitride) | ||||
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14:57 (cur | prev) +9 Mfarin talk contribs (→Etch test of Silicon Nitride) | ||||
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14:57 (cur | prev) −1 Mfarin talk contribs (→Etch test of Silicon Nitride) | ||||
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14:55 (cur | prev) +209 Mfarin talk contribs (→Etch test of Silicon Nitride) | ||||
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14:50 (cur | prev) +50 Mfarin talk contribs (→Etch test of Silicon Nitride) | ||||
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14:48 (cur | prev) 0 Mfarin talk contribs (→25 jan 2024 - SiO2 test) | ||||
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14:48 (cur | prev) +198 Mfarin talk contribs (→25 jan 2024 - SiO2 test) | ||||
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14:47 (cur | prev) +25 Mfarin talk contribs (→25 jan 2024 - SiO2 test) | ||||