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3 May 2024
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16:16 | LabAdviser 3 changes history +8 [Bghe (3×)] | |||
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16:16 (cur | prev) 0 Bghe talk contribs | ||||
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16:15 (cur | prev) +1 Bghe talk contribs | ||||
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16:14 (cur | prev) +7 Bghe talk contribs | ||||
| 16:13 | Upload log Bghe talk contribs uploaded File:Til LA forside 2024-05-03 161145.png (File uploaded with MsUpload) | ||||
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15:50 | Template:DanchipInfo 2 changes history +21 [Bghe (2×)] | |||
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15:50 (cur | prev) +2 Bghe talk contribs | ||||
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15:49 (cur | prev) +19 Bghe talk contribs | ||||
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14:44 | Specific Process Knowledge/Lithography/EBeamLithography/EBLsubstratePrep 4 changes history +300 [Thope (4×)] | |||
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14:44 (cur | prev) +1 Thope talk contribs (→DTU Nanolab supplied EBL resists) | ||||
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14:29 (cur | prev) +10 Thope talk contribs (→DTU Nanolab supplied EBL resists) | ||||
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14:29 (cur | prev) −4 Thope talk contribs (→DTU Nanolab supplied EBL resists) | ||||
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14:28 (cur | prev) +293 Thope talk contribs (→DTU Nanolab supplied EBL resists) | ||||
30 April 2024
| 10:57 | Specific Process Knowledge/Thin film deposition/ALD Picosun R200 diffhist +19 Pevo talk contribs (→Equipment performance and process related parameters) | ||||
29 April 2024
| 12:37 | Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using ASE/tests CHF3+H2 diffhist −972 Mfarin talk contribs (→Etch test of Silicon Nitride) | ||||
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11:54 | Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using ASE/More test with CF4/H2, CHF3 and C4F8/H2 - SiO2 etch 2 changes history +1,577 [Mfarin (2×)] | |||
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11:54 (cur | prev) −6 Mfarin talk contribs (→More test with CF4/H2 - SiO2 etch) | ||||
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11:53 (cur | prev) +1,583 Mfarin talk contribs | ||||