New pages

13 October 2026

• 18:4818:48, 13 October 2026 Specific Process Knowledge/Thin film deposition/Deposition of Vanadium Silicide/V3Si RF-DC Co-Sputtering in Cluster Lesker PC3 (hist | edit) [12,995 bytes] Eves (talk | contribs) (Created page with "<i>This page is written by <b>Evgeniy Shkondin @ DTU Nanolab</b> if nothing else is stated.<br> All images and data on this page belong to <b>DTU Nanolab</b>.<br> The exploratory deposition and characterization described below were performed in <b>2025</b>.<br></i> =Exploratory V-Si RF-DC co-sputtering in Cluster Lesker PC3= This page documents an early, non-systematic attempt to deposit vanadium silicide by simultaneous RF sputtering of a 4-inch Si target and DC sputt...")
• 18:4518:45, 13 October 2026 Specific Process Knowledge/Thin film deposition/Deposition of Vanadium Silicide/V3Si RF-DC Co-Sputtering in Cluster Lesker PC1 (hist | edit) [25,241 bytes] Eves (talk | contribs) (Created page with "<i>This page was written by <b>Evgeniy Shkondin, DTU Nanolab</b>, unless otherwise stated.<br> All images and photographs on this page belong to <b>DTU Nanolab</b>.<br> The fabrication and characterization described below were conducted in <b>2026 by Evgeniy Shkondin, DTU Nanolab</b>.<br></i> =Vanadium Silicide RF-DC Co-Sputtering= This document presents the results of vanadium silicide (<b>V₃Si</b>) deposition by RF-DC co-sputtering in the <i>Sputter-System...")
• 18:2218:22, 13 October 2026 Specific Process Knowledge/Thin film deposition/Deposition of V3Si (hist | edit) [6,578 bytes] Eves (talk | contribs) (Created page with "{{cc-nanolab}} '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_V3Si&action=submit click here]'''")
• 18:0218:02, 13 October 2026 Specific Process Knowledge/Thin film deposition/Deposition of Vanadium Nitride/VN Reactive Sputtering in Cluster Lesker PC1 (hist | edit) [22,351 bytes] Eves (talk | contribs) (Created page with "<i>This page was written by <b>Evgeniy Shkondin, DTU Nanolab</b>, unless otherwise stated.<br> All images and photographs on this page belong to <b>DTU Nanolab</b>.<br> The fabrication and characterization described below were carried out in <b>2026 by Evgeniy Shkondin, DTU Nanolab</b>.<br></i> =Vanadium Nitride p-DC Reactive Sputtering= This document presents the development and characterization of vanadium nitride (<b>VN_x</b>) thin films deposited by react...")
• 17:5517:55, 13 October 2026 Specific Process Knowledge/Thin film deposition/Deposition of Vanadium Nitride (hist | edit) [5,764 bytes] Eves (talk | contribs) (Created page with "{{cc-nanolab}} '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Tungsten_Nitride&action=submit click here]''' =Vanadium Nitride (WN_x)= Tungsten nitride (WNₓ, commonly W₂N or δ‑WN) is a refractory ceramic that combines very high melting temperature, extreme hardness, chemical inertness, a...")

9 October 2026

• 06:5606:56, 9 October 2026 LabAdviser/LabManager/Guide - change orderlines (hist | edit) [672 bytes] Thes (talk | contribs) (Created page with "==Guide - change orderlines==")

5 October 2026

• 16:4616:46, 5 October 2026 Specific Process Knowledge/Thin film deposition/ALD2 (PEALD)/TiN deposition using ALD2/old (hist | edit) [4,172 bytes] Eves (talk | contribs) (Created page with "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/ALD2_(PEALD)/TiN_deposition_using_ALD2 click here]''' ''This page is written by DTU Nanolab internal'' =General information= As already mentioned in the general ALD2 (PEALD) page, oxides and nitrides cannot be deposited at the same time. Since deposition of aluminum nitride requ...")
• 16:1816:18, 5 October 2026 Specific Process Knowledge/Thin film deposition/ALD2 (PEALD)/TiN plasma deposition using ALD2 (hist | edit) [15,222 bytes] Eves (talk | contribs) (Created page with " <i>This page is written by <b>Evgeniy Shkondin @DTU Nanolab</b> if nothing else is stated. <br> All images and photos on this page belongs to <b>DTU Nanolab</b>.<br> The fabrication and characterization described below were conducted in <b>2021 by Evgeniy Shkondin, DTU Nanolab</b>.<br></i> Deposition of TiN is a standard, well explored ALD process. In any book where ALD is explained or scientific reviews on a subject, the TiN process is mentioned as a standard example...")

25 September 2026

• 14:4414:44, 25 September 2026 Specific Process Knowledge/Wafer cleaning/Bring samples into Cleanroom or PolyFabLab (hist | edit) [8,503 bytes] Mmat (talk | contribs) (Created page with "=Bringing samples into the Cleanroom (346) or PolyFabLab (347)= To avoid cross contamination of tools and to keep particle levels at a minimum, we generally want to avoid bringing samples processed “outside” into the Cleanroom or PolyFabLab (PFL). If you want to bring your sample(s) in, you need to request permission from the [mailto:training@nanolab.dtu.dk Fabrication Support group]. Permission is granted on an '''individual basis''' and is only valid for the requ...")
• 14:0614:06, 25 September 2026 Specific Process Knowledge/Polymer Processing/Additive methods (hist | edit) [2,316 bytes] Meenadh (talk | contribs) (Created page with "{{cc-nanolab}} '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Polymer_Processing/Additive_methods click here]''' __TOC__ =Additive methods= Additive manufacturing enables the fabrication of three-dimensional structures directly from digital designs through layer-by-layer material deposition or polymerization. At PolyFabLab, additive manufa...")

23 September 2026

• 12:2312:23, 23 September 2026 LabAdviser/314/Microscopy 314-307/SEM/Verios (hist | edit) [139 bytes] Jenk (talk | contribs) (Created page with "| align="center" width="200px" heigth="250px" | '''Nova''' 180px|frameless |border |link=LabAdviser/314/Microscopy 314-307/SEM/Nova|Nova ")
• 12:2212:22, 23 September 2026 LabAdviser/314/Microscopy 314-307/TEM/Talos (hist | edit) [139 bytes] Jenk (talk | contribs) (Created page with "<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>200px <b>content to be created</b>")

15 September 2026

• 14:1314:13, 15 September 2026 Specific Process Knowledge/Polymer Processing/Plasma Cleaners (hist | edit) [2,893 bytes] Bghe (talk | contribs) (Created page with "''The content on this page, including all images and pictures, was created by DTU Nanolab staff, unless otherwise stated.'' '''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Polymer_Processing/Polymer_Processing_Plasma_Cleaners click here]''' =Plasma cleaner: 2 & 3= File:Plasma cleaner.jpg|400px|right|Plasma Cleaner: 2 is located in PolyFabLab,...")
• 12:4312:43, 15 September 2026 Specific Process Knowledge/Polymer Processing/Coating/Slot Die Coater (hist | edit) [2,630 bytes] Meenadh (talk | contribs) (Created page with "''The content on this page, including all images and pictures, was created by DTU Nanolab staff, unless otherwise stated.'' '''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Polymer_Processing_Coating_Slot_Die_Coater click here]''' 400px|right __TOC__ A ''' slot die coater''' is a precision coating device used to apply a thin, u...") Tag: Visual edit: Switched
• 12:0212:02, 15 September 2026 Specific Process Knowledge/Lithography/Coaters/labspin05 (hist | edit) [2,828 bytes] Meenadh (talk | contribs) (Created page with "==Spin Coater: LabSpin 04== 400px|thumb|Spin coater: LabSpin 04 is located in PolyFabLab in building 347 Spin Coater: LabSpin 04 is a model LabSpin6 TT spin coater from SUSS. It's primary purpose is spin coating of SU-8 resist. It was installed in PolyFabLab in 2025. The user manual, user APV, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=547 LabManager] - '''requires login''' '''Tr...")

8 September 2026

• 13:2813:28, 8 September 2026 Specific Process Knowledge/Polymer Processing/PDMS Casting (hist | edit) [25,838 bytes] Mmat (talk | contribs) (Created page with "<!--The document [https://www.epfl.ch/research/facilities/cmi/equipment/packaging-miscellaneous/pdms-line/ PDMS line] by EPFL was used as a reference for the structure'' !--> ==PDMS Casting== File:Compartmentalized PDMS device for reconstruction of dopamine pathways between brain organoids.jpg|thumb|Example of PDMS lab application: Compartmentalized microfluidic device for reconstruction of dopamine pathways between brain organoids ([https://doi.org/10.64898/2025.12....")
• 13:0813:08, 8 September 2026 Specific Process Knowledge/Polymer Processing/Coating/Parylene Coater (hist | edit) [5,637 bytes] Mmat (talk | contribs) (Created page with "''The content on this page, including all images and pictures, was created by DTU Nanolab staff, unless otherwise stated.'' '''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Polymer_Processing/Polymer_Processing_Coating_Parylene_Coater click here]''' 400px|right __TOC__ '''Parylene''' is the common name for a family of po...")
• 13:0613:06, 8 September 2026 Specific Process Knowledge/Polymer Processing/Coating/Inkjet Printer (hist | edit) [2,354 bytes] Mmat (talk | contribs) (Created page with "Inkjet printinter")
• 10:0110:01, 8 September 2026 Specific Process Knowledge/Polymer Processing/Additive methods/3D Printer - BMF (hist | edit) [15 bytes] Mmat (talk | contribs) (Created page with "For 3D printers") Tag: Visual edit
• 09:5409:54, 8 September 2026 Specific Process Knowledge/Polymer Processing/Additive methods/Quantum X 2PP (hist | edit) [1,772 bytes] Mmat (talk | contribs) (Created page with "thumb|470x470px|The Nanoscribe Quantum X align in PolyFabLab. == Introduction == The Nanoscribe Quantum X align is a 3D printer based on two-photon polymerization (2PP) and designed for rapid microfabrication of polymer structures. It features a femtosecond pulsed diode laser operating at 780 nm outputting a laser power of 250 mW. In addition, it is equipped with a sample stage with a 50 × 50 × 20 mm travel range that can fit up to an 8-in...")