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12:49, 7 April 2026 Bghe talk contribs deleted page Specific Process Knowledge/Characterization/SEM Gemini 1/ma (content before blanking was: "Technical specification Sample requirements Any sample allowed in the cleanroom can be imaged in Gemini 1. If you have any questions, please consult the persons responsible for the SEM. Sample sizes: Up to 8" wafers (the ranges on the X and Y axes only provide full view of a 6" wafer) Vacuum modes: The SEM is usually operated in high vacuum (HV) mode where the chamber pressure is somewhere in the 2*10-4 to 10-6 mbar range. For imaging of non-conducting sa...")
12:49, 7 April 2026 Bghe talk contribs deleted page Specific Process Knowledge/Etch/DRIE-Pegasus/FAQ/Potasi (content before blanking was: "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/FAQ/Potasi click here]'''   {{Template:Author-jmli1}}  ; Question : We have had several requests on etches that produce slop...")
12:48, 7 April 2026 Bghe talk contribs deleted page Specific Process Knowledge/Etch/DRIE-Pegasus/FAQ/Nanoetch (content before blanking was: "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/FAQ/Nanoetch click here]'''   ''Unless otherwise stated, all content on this page was created by Berit Geilmann Herstrøm, DTU Nanolab'' <!--Checked for updates on 2/02-2023...")
12:48, 7 April 2026 Bghe talk contribs deleted page Specific Process Knowledge/Etch/DRIE-Pegasus/FAQ/Matching (content before blanking was: "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/FAQ/Matching click here]'''   ; Question 1 :Last Friday I ran the first nanoetches with the recipe below - with limited success however. I was short on time so I couldn't...")
12:47, 7 April 2026 Bghe talk contribs deleted page Specific Process Knowledge/Etch/DRIE-Pegasus/FAQ/Bonding (content before blanking was: "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/FAQ/Bonding click here]'''   ; Question 1 : A user tried to etch through a wafer using a carrier and crystalbond as medium (see image below). Even though he ran the standard...")
12:47, 7 April 2026 Bghe talk contribs deleted page Specific Process Knowledge/Etch/DRIE-Pegasus/FAQ/Masks (content before blanking was: "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/FAQ/Masks click here]'''   ; Question 1 : I remember you said that you don't like Al as masking material because it will get sputtered off (am I right?) - but what about AL...")
12:41, 7 April 2026 Bghe talk contribs deleted page Specific Process Knowledge/Characterization/SEM Gemini 1/use (content was: " Detectors Se2 Inlens Inlens ESB BSD1 VPSE STEM High vacuum Low vacuum NanoVP XVP {| class="wikitable" |+ Caption text |-esb ! Detectors !! Se2 !! Inlens !! Inlens ESB !! BSD1 !! VPSE !! STEM !! Header text |- ! High vacuum || Yes || Yes ||Yes|| Yes || Example || Example || Example |- ! Low vacuum || Example || Example || Example || Example || Example ||...", and the only contributor was "Jmli" (talk))
12:37, 7 April 2026 Bghe talk contribs deleted page Specific Process Knowledge/Characterization/Optical microscope/Nikon Eclipse L200 auto scan guide (content before blanking was: "<!-- The Nikon Eclipse L200 series mikroscopes can autoscan a wafer to image the entire wafer. The mini guide below shows one way of setting this up. The guide is setup for a full wafer scan of a 6" wafer which takes app. 4-6 hours to scan and gives app. 5000 images of 3-4MB each (at 10x Objective), hence fills a lot of storage. It is recommended to '''store the data on the temporary folder''' in the C-drive and '''move the images (e.g., to the cleanroom drive)...")
12:36, 7 April 2026 Bghe talk contribs deleted page Specific Process Knowledge/Lithography/EBeamLithography/RaithPatternPreparation (content was: "= Pattern preparation for exposure on the Raith eLine Plus =", and the only contributor was "Thope" (talk))
12:36, 7 April 2026 Bghe talk contribs deleted page Specific Process Knowledge/Lithography/authors generic (content before blanking was: "")
12:35, 7 April 2026 Bghe talk contribs deleted page Specific Process Knowledge/Lithography/EBeamLithography/JEOL 9500 trouble shooting (content was: "Error messages on the JEOL 9500 system can sometimes be difficult to understand. Hence we have collected a series of the most typical errors users may encounter on the system. They are divided into compilation errors experienced at file compilation and execution errors experienced at job execution. =Compilation errors= To come =Execution errors= To come", and the only contributor was "Thope" (talk))
15:51, 12 February 2026 Bghe talk contribs created page LabAdviser/346/Organization (Created page with "Here we will add an overview of the organization taking care or the DTU Nanolab Fabriacaion facility in builidng 346/347")
15:03, 4 February 2026 Bghe talk contribs deleted page Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiO2 Etch/EM with resist mask (content before blanking was: "==Etching SiO2 with DUV resist mask using EM coils== {{CC-bghe2}} *Removing the H2 from the recipe to get less redeposition @ 200W platen power, EM:02/30A <gallery caption="Recipe name: SiO2_res, Recipe no. 10+EM+edit coils: C09975 coil_2500W, platen:200W, EM:02/30A, Pressure:8.8mTorr, C4F8:25.6sccm, He:448.7sccm, H2:0sccm, 3:56 min " perrow="5"> File:C09975_00.jpg File:C09975_02.jpg File:C09975_03.jpg File:C09975_04.jpg File:C09975_05.jpg </gallery>")
09:29, 29 September 2025 Bghe talk contribs deleted page Specific Process Knowledge/Lithography/EBeamLithography/TRACER (content was: "Delete me", and the only contributor was "Thope" (talk))
16:01, 4 September 2025 Bghe talk contribs deleted page Specific Process Knowledge/Thin Film deposition/ALD/Al2O3 deposition using ALD (content was: "This page needs to be deleted!")
16:01, 4 September 2025 Bghe talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of Germanium/Thermal Ge deposition Wordentec (content was: " Page to be deleted")
14:14, 2 September 2025 Bghe talk contribs created page File:RC2 system.jpg (File uploaded with MsUpload)
14:14, 2 September 2025 Bghe talk contribs uploaded File:RC2 system.jpg (File uploaded with MsUpload)
14:18, 14 July 2025 Bghe talk contribs created page Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/Silicon Nitride Etch (Created page with "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/RIE_(Reactive_Ion_Etch) click here]''' =THIS PAGE IS UNDER CONSTRUCTION200px=")
09:43, 11 June 2025 Bghe talk contribs changed group membership for Mmat from NLAB-Employees-701 and NLAB-LabmanagerAllUsers to NLAB-Employees-701, NLAB-LabmanagerAllUsers and administrator
14:55, 6 May 2025 Bghe talk contribs deleted page Specific Process Knowledge/Lithography/EBeamLithography/RaithElphyManual (content was: "'''Feedback to this page''': '''[mailto:e-beam@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography click here]''' = THIS PAGE IS UNDER CONSTRUCTION200px = Purpose, location and technical specifications = '''OBSOLETE! This to...", and the only contributor was "Tigre" (talk))
10:23, 6 May 2025 Bghe talk contribs deleted page Specific Process Knowledge/Lithography/EBeamLithography/JEOL Processes (content before blanking was: "THIS PAGE IS UNDER CONSTRUCTION200px =Large area circle arrays= Arrays of circles can naturally be exposed by exposing a pattern that consists of circles. In this scheme each circle will consist of a number of beam shots to fill the shape of each circle. For large areas this can however be very time consuming and pattern files can become very large. Hence, in this work we investigate a di...")
14:43, 5 May 2025 Bghe talk contribs deleted page Specific Process Knowledge/Lithography/ARP617 (content before blanking was: "Test of copolymer AR-P 617.05; a positive e-beam resist from AllResist. This copolymer is meant to be used as a sacrificial layer in a bi- or tri-layer e-beam resist stack (i.e. bottom layer). The copolymer adheres well on many substrates and can be dry-etched isotropically (to create under-cut) and anisotropically by reactive ion etch. Furthermore, it is softbaked at temperatures above 200 degrees and thus themally stable to many post-processing steps. This is...")
08:53, 5 May 2025 Bghe talk contribs deleted page Specific Process Knowledge/Etch/Etching of Molybdæn (content was: "=THIS PAGE IS UNDER CONSTRUCTION200px= <code><nowiki>=THIS PAGE IS UNDER CONSTRUCTION200px=</nowiki></code>  ==Comp...", and the only contributor was "Mbec" (talk))
14:48, 2 May 2025 Bghe talk contribs deleted page Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/HfO2 etch (content was: "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/IBE⁄IBSD_Ionfab_300/HfO2_etch click here]''' =THIS PAGE IS UNDER CONSTRUCTION200px= =jklajakjg= ==jglasdjfg==", and the only contributor was "Shuya" (talk))
14:27, 2 May 2025 Bghe talk contribs deleted page Substrates/130 mm by 130 mm by 6.35 mm substrates (not existing)
13:55, 2 May 2025 Bghe talk contribs deleted page Specific Process Knowledge/Etch/DRIE-Pegasus/Pegsus-1 (content was: "'''WRONG ADDRESS - MUST BE DELETED!!!!!''' '''The user manual(s), quality control procedure(s) and results, user APV(s), technical information and contact information can be found in LabManager:''' Equipment info in [http://labmanager.nanolab.dtu.dk/function.php?module=Machine&view=view&mach=265| LabManager] == Process information == '''SPTS process notation''' Describing a proces...", and the only contributor was "Jmli" (talk))
13:51, 2 May 2025 Bghe talk contribs deleted page Specific Process Knowledge/Etch/DRIE-Pegasus 3/DREM0.5kWv2.3 (content was: "", and the only contributor was "Jmli" (talk))
13:51, 2 May 2025 Bghe talk contribs deleted page LabAdviser/314/Microscopy 314-307/TEM/T20/Schematic (content before blanking was: "800px")
13:50, 2 May 2025 Bghe talk contribs deleted page LabAdviser/314/Microscopy 314-307/TEM/T20/Booking rules (content before blanking was: "'''Tecnai TEM Booking rules:''' '''1) Booking''' Each Tecnai user can book up to 2 SESSIONS in advance. This means that users can have only 2 SESSIONS booked for the future. It does not matter how far in the future the two sessions are booked. e.g. sessions can be booked for today & tomorrow, or today and Monday next week. Once you have 2 sessions booked, you can't book any more. As soon as you have finished one session, you can then book another. But you ca...")
13:50, 2 May 2025 Bghe talk contribs deleted page LabAdviser/CEN (content before blanking was: "'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/LabAdviser/CEN click here]''' =This page gives an overview of the electron microscope equipment and other related resources connected to DTU Nanolab - building 307/314= ==SEM== *SEM Comparison page - all of DTU Nanolabs SEMs */Nova Nan...")
13:49, 2 May 2025 Bghe talk contribs deleted page LabAdviser/CEN/AFEG 250 Analytical ESEM (content before blanking was: "'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php?title=LabAdviser/CEN/Quanta_FEG_200_ESEM click here]'''  The FEI AFEG 250 FEG is a field emission scanning electron microscope with a spatial resolution of 2 nm for the ETD detector in high vacuum at 30 keV. The microscope can o...")
11:18, 1 May 2025 Bghe talk contribs created page Specific Process Knowledge/Preparation (Created page with "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Preparation click here]''' =THIS PAGE IS UNDER CONSTRUCTION200px=")
14:07, 31 March 2025 Bghe talk contribs deleted page LabAdviser/Courses/TPT Lithography (content was: "This page can be deleted <!--- '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/LabAdviser/Courses/TPT_Lithography click here]''' DTU Nanolab offers a Tool Package Training in Lithography; the course includes theory on lithographic processes and equipment. After the TPT has been successfully completed, you can begin training on the lithography equipm...")
13:42, 31 March 2025 Bghe talk contribs deleted page Specific Process Knowledge/Etch/Etching of Polymer/Etch of Photo Resist using RIE (content was: "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/Etching_of_Polymer/Etch_of_Photo_Resist_using_RIE click here]''' = Both RIE's (RIE1 and RIE2) for silicon based etching has been decommissioned = * This information is save because it might be valuable as inspiration for other dry etch s...")
13:03, 31 March 2025 Bghe talk contribs deleted page Specific Process Knowledge/Thin film deposition/Sputtering of ITO in Sputter-System Metal-Oxide (PC1) (content was: "PLEASE DELETE THIS PAGE!", and the only contributor was "Eves" (talk))
13:03, 31 March 2025 Bghe talk contribs deleted page Specific Process Knowledge/Characterization/XRD/XRD SmartLab/ALD deposited alumina and titania XRR and SE comparison (content was: "Empty page need to be deleted!", and the only contributor was "Eves" (talk))
14:20, 28 March 2025 Bghe talk contribs created page Specific Process Knowledge/Etch/Lithium niobate (Created page with "sdddd")
14:25, 25 February 2025 Bghe talk contribs created page File:20250213 04 endpoint.jpg (File uploaded with MsUpload)
14:25, 25 February 2025 Bghe talk contribs uploaded File:20250213 04 endpoint.jpg (File uploaded with MsUpload)
14:25, 25 February 2025 Bghe talk contribs created page File:20250213 04 droppoint.jpg (File uploaded with MsUpload)
14:25, 25 February 2025 Bghe talk contribs uploaded File:20250213 04 droppoint.jpg (File uploaded with MsUpload)
14:23, 25 February 2025 Bghe talk contribs created page File:20250213 02 toppoint.jpg (File uploaded with MsUpload)
14:23, 25 February 2025 Bghe talk contribs uploaded File:20250213 02 toppoint.jpg (File uploaded with MsUpload)
14:23, 25 February 2025 Bghe talk contribs created page File:20250213 02 endpoint.jpg (File uploaded with MsUpload)
14:23, 25 February 2025 Bghe talk contribs uploaded File:20250213 02 endpoint.jpg (File uploaded with MsUpload)
14:22, 25 February 2025 Bghe talk contribs created page File:20250213 08 endpoint.jpg (File uploaded with MsUpload)
14:22, 25 February 2025 Bghe talk contribs uploaded File:20250213 08 endpoint.jpg (File uploaded with MsUpload)
14:22, 25 February 2025 Bghe talk contribs created page File:20250213 08 droppoint.jpg (File uploaded with MsUpload)
14:22, 25 February 2025 Bghe talk contribs uploaded File:20250213 08 droppoint.jpg (File uploaded with MsUpload)