File:WF 2E07a mar23 2011-060.jpg

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Etching of nanostructures in Si using DRIE-Pegasus: nano1.4 recipe, Run ID 2000, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/50 coil/platen, -20 degs.

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current11:42, 29 April 2011Thumbnail for version as of 11:42, 29 April 20111,024 × 768 (122 KB)Jml (talk | contribs)Etching of nanostructures in Si using DRIE-Pegasus: nano1.4 recipe, Run ID 2000, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/50 coil/platen, -20 degs.

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