File:WF 2C5 feb2011 120.jpg
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Etching of nanostructures in Si using DRIE-Pegasus: nano1.0 recipe, Run ID 1817, time 120 secs, SF6 38, C4F8 52, 4mtorr, 800/50 coil/platen, -10 degs.
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 16:18, 24 March 2011 | | 1,024 × 768 (126 KB) | Jml (talk | contribs) | Etching of nanostructures in Si using DRIE-Pegasus: nano1.0 recipe, Run ID 1817, time 120 secs, SF6 38, C4F8 52, 4mtorr, 800/50 coil/platen, -10 degs. |
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